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Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam

A guiding device and absorber technology, which is applied in X-ray equipment, welding equipment, laser welding equipment, etc., can solve the problems of high incident beam power and inability to completely absorb radiation energy

Active Publication Date: 2017-11-28
TRUMPF LASERSYST FOR SEMICON MFG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially in the case of very high powers of the incident beam, for example above about 50 kW, there is a problem with conventional beam traps that the radiation energy cannot be completely absorbed if necessary
Furthermore, the use of high-power laser beams for absorption (pulsed) can possibly lead to degradation phenomena (Degradationserscheinung) of the materials used in the beam trap

Method used

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  • Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam
  • Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam
  • Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam

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Embodiment Construction

[0040] FIG. 1 shows an EUV radiation generating device 1 with a beam generating device 2 (beam source), a beam guiding chamber 3 and a vacuum chamber 4 . Focusing means in the form of a focusing lens 6 are arranged in the vacuum environment constructed in the vacuum chamber 4 in order to focus the CO in the target area B 2 Laser beam 5. The EUV radiation generating device 1 shown in FIG. 1 essentially corresponds to the structure described in US 2011 / 0140008 A1, the EUV radiation generating device being made by reference to the content of this patent application.

[0041] The beam generator 2 includes CO 2 A beam source and a plurality of amplifiers for generating a laser beam 5 with a high radiation power (>1 kW). For a detailed description of an example of a possible embodiment for the beam generating device 2 see US 2011 / 0140008 A1. From the beam generating device 2, the laser beam 5 is deflected by means of a plurality of deflection mirrors 7 to 11 in the beam guidance ...

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Abstract

The invention relates to a beam trap (20), comprising: a reflector (21) for reflecting a beam impinging on a surface of the reflector (21), in particular a laser beam (5), and an absorbing apparatus (22) for absorbing the beam reflected on the surface (21a) of the reflector (21). The surface of the reflector (21) is segmented and has a plurality of reflector regions (23a-g) which are each designed to reflect a partial beam (25a-g) of the impinging beam in an absorber region (26a-g) of the absorber apparatus (22) allocated to the respective reflector region (23a-g). The invention further relates to a beam guiding device having such a beam trap (20), to an EUV radiation generating apparatus (1) having such a radiation guiding device, and to a related method for absorbing a beam, in particular for absorbing a laser beam (5).

Description

technical field [0001] The invention relates to a beam trap having such a beam trap as well as a beam guiding device for guiding a laser beam in the direction of a target region for generating EUV radiation. The invention also relates to an EUV radiation generating device with such a beam guiding device and a method for absorbing a beam, in particular a laser beam. Background technique [0002] A beam trap for absorbing the radiation energy of undesired laser radiation is known from DE 10 2010 036 161 A1. The beam trap described there comprises two reflectors, wherein at least one of the two reflectors is provided with a radiation energy-absorbing coating. The two reflectors are positioned relative to each other in such a way that the laser radiation incident on the first reflector and reflected there is directed towards the second reflector. The laser radiation incident on the second reflector and reflected here is directed back to the first reflector, so that after multi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/70
CPCB23K26/704G02B5/003H05G2/008
Inventor M·兰贝特
Owner TRUMPF LASERSYST FOR SEMICON MFG