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A water jet cleaning device and method for a wet etching machine

A technology of wet etching and cleaning equipment, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., to achieve the effects of reducing possibilities, avoiding process abnormalities, and good economic benefits

Active Publication Date: 2020-04-14
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The technical problem to be solved by the present invention is to provide a water knife cleaning device and method for a wet etching machine to improve the problem of water knife clogging, reduce the possibility of water knife bifurcation, and improve product yield

Method used

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  • A water jet cleaning device and method for a wet etching machine
  • A water jet cleaning device and method for a wet etching machine
  • A water jet cleaning device and method for a wet etching machine

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Embodiment 1

[0044] Corresponding to Embodiment 1 of the present invention, Embodiment 2 of the present invention provides a water washing method for a wet peeling machine, please refer to image 3 Shown, this washing method comprises:

[0045] Set the compressed dry air line and connect it to the water jet supply line that supplies deionized water to the water jet in the washing spray unit;

[0046] An automatic valve is set on the compressed dry air pipeline;

[0047] When the wet stripping machine enters the idle state, the automatic valve is opened, so that the compressed dry air is delivered to the water knife supply pipeline, and forms a two-fluid with the deionized water in the water knife supply pipeline, and the Water jet supply pipeline and water jet are cleaned;

[0048]When the wet stripping machine enters the working state, the automatic valve is closed, and the supply of the compressed dry air is cut off.

[0049] Wherein, the normal-pressure direct water supply pipeline i...

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PUM

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Abstract

The invention provides a water jet scalpel cleaning device and method for wet etching machines. The water jet scalpel cleaning device comprises a compressed dry air pipeline and an automatic valve, wherein the compressed dry air pipeline is connected with a water jet scalpel supply pipeline which is used for supplying deionized water for a waterjet scalpel in a water spray unit, and is used for supplying compressed dry air; the compressed dry air and the deionized water in the water jet scalpel supply pipelines form two fluids to clean the water jet scalpel supply pipeline and the water jet scalpel; and the automatic valve is arranged on the compressed dry air pipeline, and is used for being automatically started to convey the compressed dry air into the water jet scalpel supply pipeline when a wet stripping machine enters an idle state and being automatically closed to disconnect the supply of the compressed dry air when the wet stripping machine enters a working state. According to the device and method, connection parts and gaps on the whole water jet scalpel supply pipeline from a circulating water filter to a knife edge can be sufficiently cleaned, so that the possibility of water jet scalpel forking is further reduced, the caused process abnormity can be basically avoided and relatively good economic benefit is provided.

Description

technical field [0001] The invention relates to the technical field of screen display, in particular to a water knife cleaning device and method for a wet etching machine. Background technique [0002] In the TFT-LCD Array segment process, the substrate glass (Glass) needs to be cleaned in the water washing section of the wet etching machine (stripping machine). Such as figure 1 As shown, the water washing section 1΄ includes a plurality of water washing spray (Shower, SWR) units (SWR#1~SWR#5), in which the substrate glass 2΄ is conveyed, and is used for cleaning under the normal working condition of the wet stripping machine. The deionized water (DIW) is recycled from SWR#5 to SWR#1 and then discharged to the deionized water discharge pipeline (DIW Drain), during which it is pumped by the circulating water pump 3΄ equipped for each washing spray unit The circulating water is sprayed by the nozzles 111 in the water washing and spraying unit to clean the substrate glass 21 ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/02B08B9/032F26B21/00
Inventor 徐国军毛地雅刘俊林陈思
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD