Polishing device for producing monocrystalline silicon slices

A polishing device, a technology of single crystal silicon, which is applied to surface polishing machine tools, grinding/polishing equipment, metal processing equipment, etc. Simple structure and the effect of saving resources

Pending Publication Date: 2018-02-16
阜宁浔朋新材料科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Monocrystalline silicon is a relatively active non-metallic element. It is an important part of crystalline materials and is at the forefront of new material development. Its main uses are as semiconductor materials and the use of solar photovoltaic power generation, heating, etc., monocrystalline silicon slices Polishing refers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing device for producing monocrystalline silicon slices
  • Polishing device for producing monocrystalline silicon slices

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0016] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments.

[0017] Reference Figure 1-2 , A polishing device for the production of single crystal silicon slices, comprising a bottom plate 6, the top outer wall of the bottom plate 6 is welded with a box body 1, one side of the outer wall of the box body 1 is opened with an operating window 3, and the top inner wall of the box body 1 is welded with an upper liquid tank 7. A lower liquid tank is welded on the inner wall of the bottom end of the tank body 1, and the lower liquid tank and the upper liquid tank 7 are both located on the side away from the operation window 3. The upper liquid tank 7 and the lower liquid tank are both filled with polishing ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a polishing device for the production of single crystal silicon slices, which comprises a bottom plate, a box body is welded on the top outer wall of the bottom plate, an operation window is opened on one side of the outer wall of the box body, and a top inner wall of the box body is welded with a The upper liquid tank, the lower liquid tank is welded on the inner wall of the bottom end of the box body, and the lower liquid tank and the upper liquid tank are located on the side away from the operation window, and both the upper liquid tank and the lower liquid tank are filled with polishing fluid. And the bottom outer wall of the upper liquid tank and the top outer wall of the lower liquid tank are fixed with liquid flow switches equidistantly distributed by bolts, and a first through hole is opened on the outer wall of one side of the box near the top. A second through hole is opened on the side outer wall near the bottom end. The invention has a simple structure and a novel design, can allow staff to operate the equipment conveniently and quickly, saves time and effort, and can make the polishing quality of single crystal silicon higher and easier to meet the required requirements.

Description

technical field [0001] The invention relates to the technical field of single crystal silicon slice production, in particular to a polishing device for single crystal silicon slice production. Background technique [0002] Monocrystalline silicon is a relatively active non-metallic element. It is an important part of crystalline materials and is at the forefront of new material development. Its main uses are as semiconductor materials and the use of solar photovoltaic power generation, heating, etc., monocrystalline silicon slices Polishing refers to the need to improve micro-defects on the surface of single crystal silicon, so as to obtain high flatness polishing. At present, most of the polishing devices for single crystal silicon slices have the disadvantages of complex structure and inability to obtain high flatness polishing, which reduces work efficiency. Waste of resources. Contents of the invention [0003] The purpose of the present invention is to solve the shor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B24B29/02B24B57/02
CPCB24B29/02B24B57/02
Inventor 曹曙光
Owner 阜宁浔朋新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap