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Level adjusting device, pressing ring assembly and semiconductor processing equipment

A technology of level adjustment device and adjustment parts, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve problems such as difficult operation, small adjustment range of horizontal adjustment, and small tilt deformation, so as to achieve easy adjustment and increase The effect of adjusting the range

Active Publication Date: 2018-03-09
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] One, since the body 41 supports the pressure ring 1, the counterweight ring 2, and the support 3, etc., the deformed material area of ​​the body 41 must bear a certain load. Considering the strength of the parts, the deformed material area cannot be too thin. The allowable deformation of the deformable material area of ​​the main body 41 is very small, which will cause the end of the main body 41 where the top wire 41 is located to have a small amount of oblique deformation, resulting in a small adjustment range for horizontal adjustment
[0007] Its two, because the top of body 41 is load-bearing, therefore, jackscrew 42 must be arranged on the below of body 41, therefore, when adjusting the level of pressure ring 1, it is necessary to operate the screwdriver upside down to adjust jackscrew 5 and screw 4, and it is more positive to operate the screwdriver upside down. Difficult to handle with a screwdriver

Method used

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  • Level adjusting device, pressing ring assembly and semiconductor processing equipment
  • Level adjusting device, pressing ring assembly and semiconductor processing equipment
  • Level adjusting device, pressing ring assembly and semiconductor processing equipment

Examples

Experimental program
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Embodiment 1

[0040] Please also refer to Figure 3a-Figure 5b , the level adjusting device provided by the embodiment of the present invention includes a first body 10 and a second body 11 . Wherein, the first body 10 is provided with a concave portion 100, and the second body 11 is provided with a convex portion 110, and the depth H1 of the concave portion 100 is smaller than the height H2 of the convex portion 110, so that the concave portion 100 accommodates part of the convex portion 110, such as Figure 3a with 3b shown. The first body 10 is connected to the member to be adjusted (not shown in the figure, such as a pressure ring), such as Figure 3a As shown, the first body 10 is connected to a support column 20, and the support column 20 is used to support the pressure ring (ie, the part to be adjusted). The degree of inclination of the first body 10 relative to the horizontal plane can be changed by the surface sliding of the contact between the concave part 100 and the convex part...

Embodiment 2

[0056] see Figure 6a with Figure 6b The level adjustment device provided by the embodiment of the present invention is similar to the level adjustment device provided by the above-mentioned embodiment 1, and also includes the first body 10, the second body 11, the first fixing part 12 and the second fixing part 13, because the first The structure, positional relationship and connection relationship of the main body 10 , the second main body 11 , the first fixing part 12 and the second fixing part 13 have been described in detail in the above-mentioned embodiment 1, and will not be repeated here.

[0057] The following describes only the differences between this embodiment and the above-mentioned Embodiment 1. Specifically, a convex portion 110 is disposed on the first body 10 , and a concave portion 100 is disposed on the second body 11 .

[0058] In this embodiment, the first fixing part 12 and the part to be adjusted are arranged on both sides of the convex part 110 on t...

Embodiment 3

[0060] The embodiment of the present invention also provides a pressure ring assembly, including a level adjustment device and a pressure ring. The level adjustment device is used to adjust the levelness of the pressure ring. The level adjustment device adopts the level adjustment device provided in Embodiment 1 and Embodiment 2 above.

[0061] The pressure ring assembly provided by the embodiment of the present invention adopts the above-mentioned embodiment 1 and embodiment 2 to provide a horizontal adjustment device, so the pressure ring can be stacked on the edge of the substrate as horizontally as possible, thereby ensuring a certain helium leakage. In turn, the process quality can be improved.

[0062] Specifically, the pressure ring assembly also includes a plurality of first support columns, and there are multiple horizontal adjustment devices corresponding to the first support columns; the plurality of first support columns are arranged at intervals along the circumfer...

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Abstract

The invention provides a level adjusting device, a pressing ring assembly and semiconductor processing equipment. The level adjusting device of the present invention includes a first body and a secondbody. One body of the first body and the second body is provided with a protrusion, and the other body is provided with a recess for accommodating the protrusion. The depth of the recess is smaller than the height of the protrusion such that a part of the protrusion is received in the recess. The first body is connected to a to-be-adjusted member. Through the sliding of a surface where the recessand the protrusion are in contact, the first body can change relative to a degree of inclination of the first body so as to adjust the horizontal degree of the to-be-adjusted member. According to thelevel adjusting device provided by the invention, an adjustment range can be greatly increased, and thus the horizontal adjustment is convenient to realize. The pressing ring assembly of the invention comprises the level adjusting device. The semiconductor processing equipment comprises the pressing ring assembly of the invention.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment, and in particular relates to a level adjustment device, a pressure ring assembly and semiconductor processing equipment. Background technique [0002] During semiconductor processing, substrates (especially SOG substrates) are usually fixed mechanically. The mechanical fixing method specifically includes: carrying the substrate by means of a mechanical chuck, and then pressing the edge region of the upper surface of the substrate by means of a pressure ring, so as to realize the fixing of the substrate. In practical applications, in order to ensure the cooling effect of the back helium on the substrate, it is necessary to ensure a certain helium leakage, which means that the pressure ring needs to be kept horizontal when pressing the substrate. [0003] At present, for the level adjustment of the pressure ring, usually adopt Figure 1a with Figure 1b level adjustment device sho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/687H01L21/67
CPCH01L21/67011H01L21/68721
Inventor 柳朋亮
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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