Level adjusting device, pressing ring assembly and semiconductor processing equipment
A technology of level adjustment device and adjustment parts, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve problems such as difficult operation, small adjustment range of horizontal adjustment, and small tilt deformation, so as to achieve easy adjustment and increase The effect of adjusting the range
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Embodiment 1
[0040] Please also refer to Figure 3a-Figure 5b , the level adjusting device provided by the embodiment of the present invention includes a first body 10 and a second body 11 . Wherein, the first body 10 is provided with a concave portion 100, and the second body 11 is provided with a convex portion 110, and the depth H1 of the concave portion 100 is smaller than the height H2 of the convex portion 110, so that the concave portion 100 accommodates part of the convex portion 110, such as Figure 3a with 3b shown. The first body 10 is connected to the member to be adjusted (not shown in the figure, such as a pressure ring), such as Figure 3a As shown, the first body 10 is connected to a support column 20, and the support column 20 is used to support the pressure ring (ie, the part to be adjusted). The degree of inclination of the first body 10 relative to the horizontal plane can be changed by the surface sliding of the contact between the concave part 100 and the convex part...
Embodiment 2
[0056] see Figure 6a with Figure 6b The level adjustment device provided by the embodiment of the present invention is similar to the level adjustment device provided by the above-mentioned embodiment 1, and also includes the first body 10, the second body 11, the first fixing part 12 and the second fixing part 13, because the first The structure, positional relationship and connection relationship of the main body 10 , the second main body 11 , the first fixing part 12 and the second fixing part 13 have been described in detail in the above-mentioned embodiment 1, and will not be repeated here.
[0057] The following describes only the differences between this embodiment and the above-mentioned Embodiment 1. Specifically, a convex portion 110 is disposed on the first body 10 , and a concave portion 100 is disposed on the second body 11 .
[0058] In this embodiment, the first fixing part 12 and the part to be adjusted are arranged on both sides of the convex part 110 on t...
Embodiment 3
[0060] The embodiment of the present invention also provides a pressure ring assembly, including a level adjustment device and a pressure ring. The level adjustment device is used to adjust the levelness of the pressure ring. The level adjustment device adopts the level adjustment device provided in Embodiment 1 and Embodiment 2 above.
[0061] The pressure ring assembly provided by the embodiment of the present invention adopts the above-mentioned embodiment 1 and embodiment 2 to provide a horizontal adjustment device, so the pressure ring can be stacked on the edge of the substrate as horizontally as possible, thereby ensuring a certain helium leakage. In turn, the process quality can be improved.
[0062] Specifically, the pressure ring assembly also includes a plurality of first support columns, and there are multiple horizontal adjustment devices corresponding to the first support columns; the plurality of first support columns are arranged at intervals along the circumfer...
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