Semiconductor wafer bonding process
A wafer bonding and semiconductor technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as poor uniformity of bonded wafers, increased power consumption of integrated circuits, and rising investment in fabs. To achieve the effect of improving performance, improving uniformity and optimizing bond twist
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[0017] Embodiment A kind of semiconductor wafer bonding process, comprises the following steps:
[0018] (1) Provide the first wafer and the second wafer that need to be bonded, and the surface between the first wafer and the second wafer is coated with a solid spacer for isolating the wafer;
[0019] (2) providing a negative pressure environment, stacking the first wafer and the second wafer, applying at least one pressure on the central regions of the first wafer and the second wafer;
[0020] (3) performing wafer bonding on the first wafer and the second wafer; performing grinding and thinning treatment on the wafer after performing the wafer bonding.
[0021] The solid separator is a composite organic material or a composite inorganic material, and the melting point of the solid separator is between 90-180°C.
[0022] The vacuum degree of the negative pressure environment is -200mbar~-900mbar.
[0023] The bonding in the step (3) is local bonding or bonding that forms a ...
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