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Detection method of film layer thickness

A detection method and film layer technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve problems such as unfavorable cost, large manpower and material resources, cumbersome and complicated problems, so as to reduce production costs, standardize production processes, and increase production capacity Effect

Inactive Publication Date: 2018-05-18
BOE TECH GRP CO LTD +1
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  • Abstract
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Problems solved by technology

[0005] The embodiment of the present invention provides a method for detecting the thickness of the film layer, so as to solve the problem of manual repeated detection and repeated adjustment in the traditional method, resulting in cumbersome and complicated, requiring a lot of manpower and material resources, which is not conducive to the reduction of cost, the improvement of production capacity and the The problem of standardization of process

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  • Detection method of film layer thickness

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Embodiment Construction

[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0041] Please also see figure 1 , figure 1 It is a flowchart of a detection method for film thickness provided by a preferred embodiment of the present invention. Such as figure 1 As shown in, an embodiment of the present invention provides a method for detecting the thickness of a film layer, the method comprising:

[0042] Step 101, irradiating the film layer to be detected with irradiating light.

[0043] In this step, when the film layer to be ...

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Abstract

The invention provides a detection method of film layer thickness. By using illuminating light to illuminate a film layer to be detected, scattering light formed by scattering the film layer to be detected is acquired, a spectrogram is obtained according to the acquired scattering light, parameter information of a characteristic peak of the film layer to be detected can be obtained from the spectrogram, and thus the thickness of the film layer to be detected is determined through the parameter information. In this way, the thickness of the film layer to be detected can be automatically detected, repeated manual detection and repeated adjustment are not needed, time and labor are saved, the detection method is convenient to operate, the production cost is lowered, the capacity is improved,and a production technology is normalized.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for detecting film thickness. Background technique [0002] The demand for various display devices has increased with the rise of the global information society. Therefore, great efforts have been devoted to the research and development of various flat display devices, such as organic electroluminescent display devices (OLED), liquid crystal display devices (LCD), plasma display devices (PDP), electroluminescent display devices ( ELD) and vacuum fluorescent display (VFD). [0003] Whether it is a traditional organic electroluminescent display device or a traditional liquid crystal display device, the array substrate and the color filter substrate are generally fabricated separately, and then the array substrate and the color filter substrate are aligned to form a box, and then liquid crystal is injected to form a liquid crystal display panel. In the manufacturing proc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06
CPCG01B11/0683
Inventor 吕明阳李月李金钰李彦辰赵宇侯少军王冬冯大伟郭旺罗兴友
Owner BOE TECH GRP CO LTD
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