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Gas inlet pipeline protection structure for flat panel type plasma enhanced chemical vapor deposition (PECVD)

A technology for air intake pipes and protective structures, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., which can solve the problem that the coating uniformity of equipment cannot be guaranteed, the reaction gas cannot be controlled, and it takes a lot of manpower and time and other issues, to achieve the effect of low maintenance cost, simple and stable structure, and reduced production and maintenance costs

Active Publication Date: 2018-05-22
ZHEJIANG JINGSHENG MECHANICAL & ELECTRICAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This connection method leads to bending of the metal hose when the cover is opened and closed many times after long-term use
Once a leak occurs at the bend, the reaction gas entering the deposition hood cannot be controlled, and the coating uniformity of the equipment cannot be guaranteed
Since the coating is produced continuously, it will cause a batch of coated silicon wafers to be scrapped, which will directly bring large economic losses to the production enterprise.
Especially after the leakage occurs, equipment maintenance needs a lot of manpower and time, which indirectly brings huge economic losses to the production enterprises.

Method used

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  • Gas inlet pipeline protection structure for flat panel type plasma enhanced chemical vapor deposition (PECVD)
  • Gas inlet pipeline protection structure for flat panel type plasma enhanced chemical vapor deposition (PECVD)
  • Gas inlet pipeline protection structure for flat panel type plasma enhanced chemical vapor deposition (PECVD)

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Embodiment Construction

[0023] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:

[0024] Such as figure 2 The shown air inlet pipe protection structure for flat PECVD includes an air inlet seat, a dust cover dial 4 , a dust cover 5 , a screw 6 , a hook 12 and a weight 13 .

[0025] The air intake seat includes an upper air intake assembly 15 and a lower air intake assembly 17. Because three different special gases need to be introduced, three intake pistons are installed in the air intake seat, but the air intake pistons can also be adjusted according to the air intake needs. The number of gas pistons; each intake piston includes the upper intake piston 3 in the upper intake assembly 15 and the lower intake piston 9 in the lower intake assembly 17, that is, three upper intake pistons 3 and three lower intake pistons are correspondingly provided. Intake piston 9.

[0026] Such as image 3 The upper intake assembly 15 shown...

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Abstract

The invention relates to a pipeline protection structure and aims at providing a gas inlet pipeline protection structure for flat panel type plasma enhanced chemical vapor deposition (PECVD). The gasinlet pipeline protection structure for flat panel type PECVD comprises a gas inlet base, a dust cover shifting plate, a dust cover, a threaded rod, hooks and a heavy punch. The gas inlet pipeline protection for flat panel type PECVD is designed through a pure mechanical mechanism, the structure is simple and stable, and the later maintaining cost is low. By means of the gas inlet pipeline protection structure for flat panel type PECVD, the defect that after a flexible metal pipe is bent multiple times, cracks are prone to being generated on the flexible metal pipe is overcome, the time of equipment shutdown caused by gas leakage is shortened, the production cost and the maintaining cost are indirectly reduced for an enterprise; and by means of the gas inlet pipeline protection structure,inventory accessories can be greatly reduced for the enterprise, and the production cost is direction reduced for the enterprise.

Description

technical field [0001] The invention relates to the field of pipeline protection structures, in particular to an intake pipeline protection structure for flat PECVD. Background technique [0002] PECVD (Plasma Enhanced Chemical Vapor Deposition), that is, plasma enhanced chemical vapor deposition technology, refers to the use of microwave or radio frequency to ionize the gas containing the constituent atoms of the film to form plasma locally. The desired film is deposited. This technology is widely used in the production of crystalline silicon solar cells. [0003] The existing air intake method for coating on flat PECVD is generally to weld the intake pipe on the side flange of the chamber, and the inside of the chamber is connected to the air intake pipe on the chamber cover plate through a metal hose. During the cleaning, maintenance and inspection of the inside of the chamber, the cover plate needs to be opened; before the coating production, the cover plate needs to b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455C23C16/513
CPCC23C16/45561C23C16/513Y02P70/50
Inventor 傅林坚石刚洪昀吴威高振波王伟星祝广辉
Owner ZHEJIANG JINGSHENG MECHANICAL & ELECTRICAL
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