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Indirectly Heated Cathode Ion Source

A heating, ion source technology, applied in the discharge tube solid thermionic cathode, plasma, ion beam tube, etc., can solve problems such as cathode erosion

Active Publication Date: 2020-02-14
VARIAN SEMICON EQUIP ASSOC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This bombardment causes sputtering, which leads to erosion of the cathode

Method used

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  • Indirectly Heated Cathode Ion Source
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  • Indirectly Heated Cathode Ion Source

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Embodiment Construction

[0016] As noted above, indirectly heated cathode ion sources can be susceptible to reduced lifetime due to the effects of sputtering, especially on the cathode and repeller. Typically, over time, one or both of these components often fails as holes grow through the components.

[0017] figure 1 An indirectly heated cathode ion source 10 that overcomes these problems is shown. The indirectly heated cathode ion source 10 includes a chamber 100 having two opposing ends, and sides connected to those ends. The chamber may be constructed from an electrically conductive material. The cathode 110 is disposed at one of both ends of the chamber 100 in the chamber 100 . The cathode 110 is in communication with a cathode power supply 115 for biasing the cathode 110 with respect to the chamber 100 . In some embodiments, cathode power supply 115 may negatively bias cathode 110 relative to chamber 100 . For example, cathode power supply 115 may have an output in the range of 0V to -150V...

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Abstract

The present invention discloses an indirectly heated cathode (IHC) ion source with improved lifetime. The indirectly heated cathode ion source includes a chamber having a cathode and a repeller on opposite ends of the ion source. Bias electrodes are disposed on one or more sides of the ion source. A bias voltage applied to at least one of the cathode, the repeller, and the electrode relative to the chamber changes over time. In certain embodiments, the voltage applied to the electrodes may start from an initial positive voltage. Over time, this voltage can be reduced while still maintaining the target ion beam current. Advantageously, using this technique, the lifetime of the cathode is increased.

Description

[0001] This application claims priority to U.S. Provisional Patent Application No. 62 / 245,567, filed October 23, 2015, and U.S. Patent Application No. 14 / 972,412, filed December 17, 2015, The entire contents of said US Provisional Patent Application and US Patent Application are incorporated herein by reference. technical field [0002] Embodiments of the present invention relate to an indirectly heated cathode (IHC) ion source, and more particularly, to an indirectly heated cathode ion source with variable electrode voltages to increase the indirect Heated cathode ion source lifetime. Background technique [0003] Indirectly heated cathode (IHC) ion sources operate by supplying current to a filament positioned behind the cathode. The filaments emit thermionic electrons, which accelerate toward and heat the cathode, which in turn causes the cathode to emit electrons into the chamber of the ion source. The cathode is positioned at one end of the chamber. A repeller is usua...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J27/02H01J27/08
CPCH01J1/22H01J27/205H05H1/03H01J27/022H01J27/08H01J27/024
Inventor 丹尼尔·艾凡瑞朵可劳斯·贝克大卫·阿克曼
Owner VARIAN SEMICON EQUIP ASSOC INC