Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Single freedom degree large-stroke nanometer displacement positioning platform based on flexure hinges

A technology of flexible hinges and positioning platforms, which is applied to the parts of instruments and instruments, etc., to achieve the effect of simple overall structure, small size and wide application scenarios

Active Publication Date: 2018-06-22
SANYING MOTIONCONTORL TIANJIN INSTR CO LTD
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a single-degree-of-freedom large-stroke nano-displacement positioning platform and method based on flexible hinges, so as to solve the aforementioned problems in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Single freedom degree large-stroke nanometer displacement positioning platform based on flexure hinges
  • Single freedom degree large-stroke nanometer displacement positioning platform based on flexure hinges
  • Single freedom degree large-stroke nanometer displacement positioning platform based on flexure hinges

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0033] See Figure 1-4 , The present invention provides a single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges, including a platform main body 5 on which there are four flexible hinges, and the platform main body 5 is divided into A zone by four hinges, There are four parts: B area, C area and D area, the A area is a moving area, the B area and C area are the force deformation area, and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a single freedom degree large-stroke nanometer displacement positioning platform based on flexure hinges. The single freedom degree large-stroke nanometer displacement positioning platform based on the flexure hinges includes a platform main body, wherein the four flexure hinges are arranged on the platform main body, and the platform main body is divided into four parts bythe four hinges, specifically, the area A, the area B, the area C and the area D. The area A is a mobile area, the area B and the area C are stress deformation areas, and the area D is a fixed area. Aleft blind hole and a right blind hole are formed in the two ends of the platform main body, the bottom portion of the left blind hole is a smooth circular cone surface, and a spring pretightening assembly is installed in the left blind hole. The bottom portion of the right blind hole is also a smooth circular cone surface, and a piezoceramic assembly is installed in the right blind hole. The spring pretightening assembly and the piezoceramic assembly constitute an amplifying mechanism. A relatively large vertical displacement under the condition of a small vertical platform size is achieved,and the demand for a large vertical stroke with a small space occasion can be satisfied.

Description

Technical field [0001] The invention is a nano-displacement positioning platform that can realize a large vertical displacement stroke, and ensures that the vertical dimension is small, so as to meet the actual use occasions with small vertical space. Background technique [0002] Nano-positioning platform is used to generate nano-level displacement and realize nano-level positioning control. It is mainly used in high-tech industries such as atomic force microscopes, precision optical equipment, and semiconductor equipment. The development of advanced semiconductor chip manufacturing technology and large-scale memory manufacturing technology has pushed nano-displacement and nano-positioning technology to a new level. Precision measurement and inspection technology is considered to be the technical bottleneck that the next generation of semiconductor chip manufacturing technology and large-scale memory manufacturing technology must break through. Metrology and detection based on ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G12B5/00
CPCG12B5/00
Inventor 须颖王慧峰
Owner SANYING MOTIONCONTORL TIANJIN INSTR CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products