A single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges

A technology of flexible hinges and positioning platforms, which is applied to the parts of instruments, instruments, etc.

Active Publication Date: 2021-05-11
SANYING MOTIONCONTORL TIANJIN INSTR CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a single-degree-of-freedom large-stroke nano-displacement positioning platform and method based on flexible hinges, so as to solve the aforementioned problems in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges
  • A single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges
  • A single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0033] see Figure 1-4 A single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges provided by the present invention includes a platform main body 5, and there are four flexible hinges on the platform main body 5, and the platform main body 5 is divided into A zone, There are four parts of B zone, C zone and D zone, the A zone is a moving zone, the B zone and C zone are stress deformation zones, and the D zone is a f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention provides a single-degree-of-freedom large-stroke nano-displacement positioning platform based on flexible hinges, including a platform main body. There are four flexible hinges on the platform main body, and the platform main body is divided into A zone, B zone and C zone by the four hinges. , four parts of D area, the A area is a moving area, the B area and C area are force deformation areas, and the D area is a fixed area; the two ends of the main body of the platform are provided with a left blind hole and a right blind hole, The bottom of the left blind hole is a smooth conical surface, and a spring preload assembly is installed inside it, and the bottom of the right blind hole is also a smooth conical surface, and a piezoelectric ceramic assembly is installed inside it, and the spring preload assembly is installed inside it. The component and the piezoelectric ceramic component constitute the amplification mechanism. The invention realizes relatively large vertical displacement under the condition of small vertical platform size, and can meet the requirement of occasions with small space but large vertical travel.

Description

technical field [0001] The invention provides a nano-displacement positioning platform capable of realizing a large displacement stroke in the vertical direction, and ensures a small size in the vertical direction, so as to meet the actual application occasions where the space in the vertical direction is small. Background technique [0002] The nanopositioning platform is used to generate nanometer-level displacement and realize nanometer-level positioning control. It is mainly used in high-tech industries such as atomic force microscopes, precision optical equipment, and semiconductor equipment. The development of advanced semiconductor chip manufacturing technology and large-scale memory manufacturing technology has pushed nano-displacement and nano-positioning technology to a new height. Precision measurement and detection technology is considered to be the technical bottleneck that must be broken through in next-generation semiconductor chip manufacturing technology and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G12B5/00
CPCG12B5/00
Inventor 须颖王慧峰
Owner SANYING MOTIONCONTORL TIANJIN INSTR CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap