Method for optimizing central wavelength of optical filter of lithography machine

Abstract

The invention discloses a method for optimizing the central wavelength of the optical filter of a lithography machine. The method comprises following steps: step a, installing an optical filter on anangle adjusting device; and step b, starting the angle adjusting device to rotate the optical filter to a certain angle. By changing the placement angle of the narrow band optical filter in a lithography machine, the central wavelength can be changed by 6 nm. Before a lithography machine leaves a factory, an angle that the narrow band optical filter needs to deflect in the lithography machine is provided; a narrow band optical filter with a central wavelength greater than 365 nm in the lithography machine can reach the effect of an optical filter with a central wavelength close to 365 nm; andat the same time, the lithography machine that uses the optical filter can reach a maximal performance ratio.

Description

technical field [0001] The invention belongs to the field of integrated circuit manufacturing, and in particular relates to a method for optimizing the central wavelength of a photolithography machine filter. Background technique [0002] I-line (that is, light with a wavelength near 365nm) lithography machine needs to use a 365nm filter. The 365nm filter is used to filter other wavelengths of light that are harmful to the product except 365nm (such as 365±3nm), and Obtain the highest possible light intensity so that there will be a higher production speed, [0003] Under the current circumstances, in the lithography machine, the optical filters are placed in the direction perpendicular to the light. The processing of the narrow-band filter of the lithography machine is very difficult, and the central wavelength of many products often appears to be different. Just at the 365nm position, if the filter is installed on the lithography machine, it will cause the lithography mac...

AI Technical Summary

Problems solved by technology

[0003] Under the current circumstances, in the lithography machine, the optical filters are placed in the direction perpendicular to the light. The processing of the narrow-band filter of the lithography machine is very difficult, and the central wavelength of many products often appears to be different. Just at the 365nm position, so that the filter is installed on the lithography machine, which will cause the lithography machine to be unable to obtain the highest light intensity and thus cannot obtain the fastest production speed

Therefore, it is necessary to use the angle at which the narrow-band filter is placed in the lithography machine to obtain the maximum light intensity, but it is very difficult to determine the specific angle of the filter, and it is often only roughly estimated, and then the filter The light sheet is locked at the estimated angle, but the most accurate angle cannot be obtained

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