Growth method of organic monocrystal micro-strip P-N heterojunction array

A growth method and technology of micro-strips, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of difficult to control the accurate growth of upper layer materials, unable to accurately locate single crystal materials, etc.

Active Publication Date: 2018-07-31
苏州英凡瑞得光电技术有限公司
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Problems solved by technology

However, this method is difficult to control the accurate growth of the upper layer of material on the pre-built first layer of material, in other words, this method cannot accurately position the growth of the upper layer of single crystal material

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  • Growth method of organic monocrystal micro-strip P-N heterojunction array
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  • Growth method of organic monocrystal micro-strip P-N heterojunction array

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Embodiment Construction

[0031] figure 1 It is a schematic flowchart of a method for growing an organic single crystal microribbon P-N heterojunction array according to an embodiment of the present invention. Such as figure 1 As shown, the growth method includes the following steps:

[0032] S100, providing a substrate, and performing photolithography on the substrate to obtain a negative photoresist array, where the photoresist array is an array formed by a plurality of photoresist stripes arranged at intervals;

[0033] S200, using a hydrophobic monolayer solution to modify the photoresist array to obtain a negative photoresist template with hydrophilic and hydrophobic properties;

[0034] S300. Dissolving the N-type material in the first solvent to obtain a solution of the N-type material, and immersing the photoresist template in the solution of the N-type material in a vertical manner until the photoresist template is completely immersed in the N-type material After the solution of the materia...

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Abstract

The invention provides a growth method of an organic monocrystal micro-strip P-N heterojunction array. The method comprises the steps that a substrate is provided, and photoetching is conducted on thesubstrate to obtain a negative photoresist array; the negative photoresist array is modified through a hydrophobic monomolecular layer solution to obtain a photoresist template; the photoresist template is vertically soaked into an N type material solution till the photoresist template is completely immersed into the N type material solution, then the photoresist template is taken out, and an N type monocrystal micro-strip is formed on the photoresist template; the photoresist template is vertically soaked into a P type material solution till the photoresist template is completely immersed into the P type material solution, then the photoresist template is taken out to form a P type monocrystal micro-strip on the photoresist template, and then the organic monocrystal micro-strip P-N heterojunction array is formed. The prepared micro-strip P-N heterojunction array is a monocrystal material, and accurate orientation growth of P-N heterojunctions of an up-down stacked structure can be achieved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a method for growing an organic single crystal microribbon P-N heterojunction array. Background technique [0002] Organic single-crystal semiconductors have a highly ordered molecular arrangement, a structural feature that gives them high carrier mobility, so they have a wide range of potential applications in organic circuits. Currently, there are various methods for patterning or arraying organic single crystals, such as inkjet printing, solution coating, and template self-assembly. It has been reported that the mobility of organic single crystals patterned or arrayed by these methods can exceed 10 cm 2 V -1 the s -1 . However, most of these organic materials only have unipolar properties such as P-type or N-type, which affects their application in complementary metal-oxide-semiconductor circuits (CMOS circuits) and new devices such as light-emitting transistors. ...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): C30B29/54C30B7/00H01L21/8238
CPCC30B7/00C30B29/54H01L21/823807
Inventor张秀娟张晓宏揭建胜邓巍茆健
Owner苏州英凡瑞得光电技术有限公司