Method for preparing phenolic aerogel through ambient pressure drying method and prepared phenolic aerogel
An atmospheric drying and aerogel technology, which is applied to the preparation of phenolic aerogels by atmospheric drying, in the field of phenolic aerogels, can solve the complex preparation process of phenolic aerogels, poor phenolic aerogel performance, Problems such as low gel strength, to achieve the effect of reducing cost and operating complexity, low cost and short cycle
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0043] Resorcinol+formaldehyde phenolic precursor system is adopted, 3-chloropropyl trichlorosilane is used as modifier, the catalyst is 0.1mol / L hydrochloric acid solution, and the organic solvent is isopropanol; wherein the concentration of phenolic precursor is 10wt% , the molar ratio of phenolic precursor:modifier:catalyst is 50:5:1; the above raw materials are mixed and stirred evenly to obtain the precursor solution.
[0044] The precursor solution was placed in a sealed ampoule, then placed in a water bath at 60°C, and reacted (sol-gel reaction) for 96 hours to obtain a phenolic alcohol gel.
[0045] Take the phenolic alcohol gel out of the sealed ampoule, place it in the air at room temperature for 36 hours, and then dry it in an oven. The drying procedure in the oven is: first dry at 60°C under normal pressure for 24 hours, and then heat up Dry at 80°C under normal pressure for 24 hours, then raise the temperature to 120°C and dry at normal pressure for 24 hours, and ...
Embodiment 2
[0048] Resorcinol+formaldehyde phenolic precursor system is adopted, 3-chloropropyl trichlorosilane is used as modifier, the catalyst is 0.1mol / L hydrochloric acid solution, and the organic solvent is isopropanol; wherein the concentration of phenolic precursor is 10wt% , the molar ratio of phenolic precursor:modifier:catalyst is 100:10:1; the above raw materials are mixed and stirred evenly to obtain the precursor solution.
[0049] The precursor solution was placed in a sealed ampoule, then placed in a water bath at 80°C, and reacted for 48 hours to obtain a phenolic alcohol gel.
[0050] Take the phenolic alcohol gel out of the sealed ampoule, place it in the air at room temperature for 36 hours, and then dry it in an oven. The drying procedure in the oven is: first dry at 60°C under normal pressure for 24 hours, and then heat up Dry at 80°C under normal pressure for 24 hours, then raise the temperature to 120°C and dry at normal pressure for 24 hours, and finally raise the...
Embodiment 3
[0053] Resorcinol+formaldehyde phenolic precursor system is adopted, 3-chloropropyl trichlorosilane is used as a modifying agent, the catalyst is 0.1mol / L potassium hydroxide solution, and the organic solvent is isopropanol; wherein the concentration of the phenolic precursor is 15 wt%, the molar ratio of phenolic precursor:modifier:catalyst is 100:5:1; the above raw materials are mixed and stirred evenly to obtain a precursor solution.
[0054] The precursor solution was placed in a sealed ampoule, then placed in a 60°C water bath, and reacted for 72 hours to obtain a phenolic alcohol gel.
[0055] Take the phenolic alcohol gel out of the sealed ampoule, place it in the air at room temperature for 36 hours, and then dry it in an oven. The drying procedure in the oven is: first dry at 60°C under normal pressure for 24 hours, and then heat up Dry at 80°C under normal pressure for 24 hours, then raise the temperature to 120°C and dry at normal pressure for 24 hours, and finally ...
PUM
Property | Measurement | Unit |
---|---|---|
boiling point | aaaaa | aaaaa |
specific surface area | aaaaa | aaaaa |
pore size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com