Cleaning equipment used before evaporation and cleaning method thereof

A cleaning equipment and evaporation technology, which is applied in the direction of cleaning methods using tools, cleaning methods using liquids, cleaning methods and utensils, etc., which can solve the problems of general cleaning effect of objects to be evaporated
CN108543750AActive Publication Date: 2018-09-18浙江环迪工贸有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
浙江环迪工贸有限公司
Publication Date
2018-09-18

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Abstract

The invention discloses cleaning equipment used before evaporation. The cleaning equipment comprises a box body and a box cover, the box body is provided with a water tank, a power supply, a control device, a motor and an electric cylinder, wherein the water tank, the power supply, the control device, the motor and the electric cylinder are both fixedly connected with the box body, a coupler is arranged on the motor, a rotating shaft is connected to the coupler, a first pneumatic finger and a second pneumatic finger which are used for clamping a to-be-evaporated object are arranged in the boxbody, a turntable bearing is arranged on the second pneumatic finger, the first pneumatic finger and the second pneumatic finger are electrically connected with the electric cylinder, a water pipe isarranged on the water tank, the water pipe is connected with the water tank through bolts, an electric water pump is arranged on the water pipe, the electric water pump is connected with a water pipeflange, and the motor, the electric cylinder and the electric water pump are electrically connected with the control device. The cleaning equipment used before evaporation can be used for effectivelycleaning the to-be-evaporated object.
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Description

technical field

[0001] The invention relates to a cleaning device used for evaporation before deposition and a cleaning method thereof. Background technique

[0002] Evaporation is the process of evaporating or sublimating the substance to be filmed in a vacuum, so that it is deposited on the surface of the workpiece or substrate. It can deposit metals, semiconductors, semiconductors, etc. on the surface of metals, semiconductors, insulators, and even plastics, paper, and fabrics. Thin films of insulators, alloys with different composition ratios, compounds, and some organic polymers.

[0003] However, the surface of the evaporated material needs to be cleaned before evaporation, and the existing cleaning equipment has a general cleaning effect on the evaporated material, and cannot effectively clean the evaporated material. Contents of the invention

[0004] The technical problem to be solved by the present invention is to provide a cleaning device and cleaning method be...

Claims

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