Method, system and storage medium for controlling additives in mixed electroplating solution
A technology of electroplating additives and control methods, applied in the direction of electrolytic components, electrolytic processes, cells, etc., can solve problems such as increased chip complexity, and achieve the effect of avoiding air bubbles
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[0066] In this embodiment, the first arrangement is figure 1 The experimental device of the three-electrode electrochemical test system shown, the basic electroplating solution contains copper sulfonate and a small amount of sodium chloride, which contains Cu 2+ The concentration is 0.63mol / L, CH 3 SO 3 ˉ The concentration is 0.21mol / L, Cl ˉ The concentration is 50 ppm; the electrode is set to rotate at 600 rpm; the injector is the electroplating additive solution to be tested.
[0067] The method for controlling additives in the mixed electroplating solution of this embodiment includes the following steps:
[0068] S1: Determine the electroplating additives to be interacted with are PEG, SPS and JGB;
[0069] S2: Perform a single first electroplating experiment for each electroplating additive in the mixed electroplating solution, and obtain the first constitutive equation of the relationship between the concentration, adsorption rate and potential of each electroplating additive by...
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