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Metal parts and method for manufacturing same and process chamber provided with metal parts

A technology for metal components and processing chambers, applied in metal material coating technology, electrolytic components, gaseous chemical plating, etc., can solve problems such as peeling and cracks

Pending Publication Date: 2018-11-23
ABM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The anodized film (20) having pores is mainly composed of a porous layer (42), and thus there is a problem that cracks are generated in the anodized film due to internal stress or thermal expansion change, or the anodized film having pores (20) Stripping
However, in the case of exposed aluminum or aluminum alloy members, the processing gas and aluminum react chemically with each other, thus generating aluminum fume (Al Fume) that forms particles on the substrate of a semiconductor device or a liquid crystal display device

Method used

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  • Metal parts and method for manufacturing same and process chamber provided with metal parts
  • Metal parts and method for manufacturing same and process chamber provided with metal parts
  • Metal parts and method for manufacturing same and process chamber provided with metal parts

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Embodiment Construction

[0041] Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. The above and other objects, features and other advantages of the present invention will be more clearly understood from the following detailed description in conjunction with the accompanying drawings. However, it should be understood that the embodiments of the present invention can be changed into various embodiments, and the scope and spirit of the present invention are not limited to the embodiments described below. The embodiments of the present invention described hereinafter allow those skilled in the art to understand the present invention more clearly. In addition, the scope of the present invention is defined only by the claims of the appended claims and their equivalents (where appropriate). Throughout the drawings, the same reference numbers will refer to the same or similar parts.

[0042] The terms used in the specificatio...

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Abstract

The present invention relates to a metal part and a process chamber having the metal part and, more particularly, to a metal part and a process chamber provided with the same, the metal part enablinga process failure and a production yield decrease of a display or a semiconductor to be prevented by forming a hole-free anodization barrier layer on the surface of a metal part used in a display or semiconductor manufacturing process and a process chamber having the same.

Description

technical field [0001] The present invention generally relates to metal components, methods of manufacture thereof, and processing chambers having such metal components. More particularly, the present invention relates to a metal member constituting an inner surface of a processing chamber used in a manufacturing process of a display or a semiconductor, and a processing chamber having the above-mentioned metal member, and a method of manufacturing the same, and installed as Process chamber internals. Background technique [0002] Generally speaking, chemical vapor deposition CVD (Chemical Vapor Deposition) equipment, physical vapor deposition PVD (Physical Vapor Deposition) equipment, and dry etching equipment (hereinafter referred to as "processing chamber") use reaction gas, etching gas or cleaning gas (hereinafter referred to as "processing gas"). Since a corrosive gas such as Cl, F, or Br is mainly used as this process gas, corrosion resistance is important. [0003] ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/02C25D11/12C25D11/18C25D11/24C25D11/04C25D21/12C23C16/44C25D11/10
CPCC25D11/10C25D11/12C25D11/24C25D11/06C25D11/08C25D11/26C25D11/34C23C16/4404C23C16/4581C25D11/02C25D11/18C25D11/246C25D11/045C25D21/12C25D11/04B32B2255/06B32B2255/20C23C16/44
Inventor 安范模朴胜浩
Owner ABM
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