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Enclosed cavity body capable of detecting gas leakages

A gas detection and airtight cavity technology, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, discharge tubes, etc., to achieve the effect of improving safety

Active Publication Date: 2018-11-27
淮安西德工业设计有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since HMDS is toxic, corrosive, flammable and explosive to the human body, it is very important to detect the leakage of HMDS in time while ensuring the sealing of the cavity during the coating process

Method used

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  • Enclosed cavity body capable of detecting gas leakages
  • Enclosed cavity body capable of detecting gas leakages
  • Enclosed cavity body capable of detecting gas leakages

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0031] figure 2 It is a schematic structural diagram of the airtight cavity of the first embodiment of the present invention; image 3 It is a schematic diagram of the vertical cross-sectional structure of the airtight cavity of the first embodiment of the present invention.

[0032] refer to figure 2 , the airtight cavity includes: an upper cavity 100, a lower cavity 200 and a sealing ring 300, the upper surface of the lower cavity 200 is attached to the lower surface of the upper cavity 100 to form a closed space; the sealing The ring 300 is disposed between the upper chamber 100 and the lower chamber 200; the upper chamber 100 is provided with an air inlet 101 and an air outlet 102 on the upper surface.

[0033] In this embodiment, the gas inlet 101 is used to introduce process gas, and the exhaust port 102 is used to evacuate the closed cavity before performing the process and discharge the remaining process gas during the process. gas.

[0034] In this embodiment, t...

no. 2 example

[0050] Figure 6 It is a schematic structural diagram of the closed cavity of the second embodiment of the present invention; Figure 7 It is a bottom view of the upper chamber of an example of the second embodiment of the present invention.

[0051] refer to Figure 6 Compared with the airtight cavity of the first embodiment, this embodiment differs in that the purge gas outlet 103 is arranged on the outer side of the upper cavity 100 and communicates with the first groove 110; The inlet 203 is disposed on the outer side of the lower cavity 200 and communicates with the second groove 210 . That is, the purge gas inlet 203 and the purge gas outlet 103 are respectively arranged on two sides of the sealed cavity.

[0052] Such as Figure 7 As shown, the first gas passage 110A and the second gas passage (not shown) are respectively an annular groove whose ring width is smaller than that of the first groove 110 or the second groove ( not shown) ring width.

[0053] Preferabl...

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PUM

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Abstract

The invention discloses an enclosed cavity body capable of detecting gas leakages. The cavity body comprises an upper cavity body, a lower cavity body, a sealing ring, a first groove and a second groove. An air inlet and an air outlet are arranged in the upper surface of the upper cavity body. The upper surface of the lower cavity body is adhered to the lower surface of the upper cavity body, so an enclosed space is formed. The sealing ring is arranged between the upper cavity body and the lower cavity body. The first groove is in shape of a ring, is arranged on the edge of the lower surface of the upper cavity body and arranged on the outer side of the sealing ring. The second groove is in the shape of a ring, arranged on the edge of the upper surface of the lower cavity body and arrangedon the outer side of the sealing ring. The first groove and the second groove are oppositely arranged, so an annular enclosed isolation structure is formed. According to the invention, by setting anenclosed isolation structure on the outer side of the sealing ring, a cleaned gas shield is formed and leakages of process gas can be timely detected.

Description

technical field [0001] The invention relates to the manufacturing field of semiconductor substrates, in particular to a closed cavity capable of detecting gas leakage. Background technique [0002] In the semiconductor production process, lithography is an important process link for pattern transfer of integrated circuits. The quality of gluing directly affects the quality of lithography, and the gluing process is also particularly important. Most of the photoresist in the photolithography coating process is hydrophobic, while the hydroxyl groups on the surface of the silicon wafer and the residual water molecules are hydrophilic, which results in poor adhesion between the photoresist and the silicon wafer. It will invade the junction between the photoresist and the silicon wafer, and it is easy to cause floating stripes, floating glue, etc., resulting in a decrease in the accuracy of the photolithographic pattern, and it is prone to lateral corrosion during wet etching. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01J37/32
CPCH01J37/32513H01J37/3288H01L21/67253
Inventor 王立聪颜廷彪叶日铨黄志凯
Owner 淮安西德工业设计有限公司