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Mask, manufacturing method thereof, array substrate and manufacturing method of array substrate

A manufacturing method and an array substrate technology, which are applied in the fields of array substrates and their manufacturing, mask plates and their manufacturing methods, and can solve problems such as inability to gather light and difficult to achieve thinner lines in wiring areas, etc.

Inactive Publication Date: 2018-11-30
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing masks cannot gather the light, and it is difficult to achieve thinner lines in the wiring area.

Method used

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  • Mask, manufacturing method thereof, array substrate and manufacturing method of array substrate
  • Mask, manufacturing method thereof, array substrate and manufacturing method of array substrate
  • Mask, manufacturing method thereof, array substrate and manufacturing method of array substrate

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Embodiment Construction

[0036] Embodiments will now be described more fully with reference to the accompanying drawings. Embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concepts of the embodiments to the art. technical staff. The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of the specific details, or other methods, etc. may be employed. In other instances, well-known technical solutions have not been shown or described in detail to avoid obscu...

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Abstract

The invention provides a mask, a manufacturing method thereof, an array substrate and a manufacturing method of the array substrate. The manufacturing method of the mask comprises the steps that a substrate is provided, and the substrate comprises a first surface and a second surface which are arranged oppositely; a light shielding layer is formed on the first surface and comprises a plurality oflight shielding areas, and light transmitting areas are constituted between the adjacent light shielding areas; and convex lens structures are formed on the positions, corresponding to the light transmitting areas, of either of the first surface and the second surface, and the refractive index of the convex lens structure is greater than that of the substrate. Through the formed convex lens structure with the refractive index being greater than that of the substrate, light rays passing through the light transmitting areas can be gathered, thus the half-peak width of light is decreased, and thinning manufacturing of circuits in a routing area is achieved.

Description

technical field [0001] The invention relates to the display field, in particular to a mask plate and a manufacturing method thereof, an array substrate and a manufacturing method thereof. Background technique [0002] The monitor is the most important terminal output device of the electronic computer. As an important part of the display, the array substrate has an important influence on the performance of the display. [0003] When fabricating the array substrate, it is necessary to use a mask plate to perform an exposure process, and the mask plate is used as a master plate for fabricating the circuit of the array substrate. However, the existing mask plate cannot gather light, and it is difficult to realize the thinning of lines in the wiring area. [0004] It should be noted that the information disclosed in the above background technology section is only used to enhance the understanding of the background of the present invention, and therefore may include information ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/54G03F1/26H01L21/77
CPCG03F1/26G03F1/54H01L27/1288
Inventor 纪昊亮王世君冯博肖文俊董骥陈晓晓杨冰清
Owner BOE TECH GRP CO LTD
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