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Laser direct writing device based on Damman grating

A technology of laser direct writing and Damman grating, which is applied in the field of laser direct writing, can solve the problems of limited precision and laser diffraction limit, and achieve the effects of improving the efficiency of grating direct writing, facilitating operation, and reducing size

Inactive Publication Date: 2019-01-29
JINAN UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the prior art, the Daman grating can be used to realize the preparation of large-area gratings. However, only using the Daman grating can increase the speed of direct writing, but the accuracy of direct writing is still limited by the diffraction limit of Rayleigh resolution of the laser.

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  • Laser direct writing device based on Damman grating
  • Laser direct writing device based on Damman grating

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Embodiment Construction

[0023] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0024] figure 1 It is a structural schematic diagram of the laser direct writing device based on the Damman grating of the present invention. As shown in the figure, the Damman grating-based laser direct writing device of the present invention includes a mobile platform 20, a Damman grating laser direct writing optical path, a self-focusing optical path, and a control system.

[0025] A horizontal adjustment platform 19 is arranged on the mobile platform 20 , and the grating substrate to be written is placed on the horizontal adjustment platform 19 . There are two light sources in the Damman grating laser direct writing optical path, which are the excitation light source 1 and the loss light source 3. The wavelength of the excitation light source 1 is λ 1 , the wavelength...

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Abstract

The invention relates to a laser direct writing device based on a Damman grating. STED super-resolution is introduced into a Damman grating laser direct writing optical path part, STED super-resolution imaging is fully utilized for overlapping two kinds of spatially-distributed spots of excitation light and loss light, fluorescent light in an overlapping region is quenched so that only a very small range of a central region can be radiated by the fluorescent light to achieve super-resolution imaging, a smaller focused spot can be produced, the writing density is increased accordingly, and high-density grating writing can be achieved. On this basis, multiple grating lines can be directly written at a time by utilizing the Damman grating, and the direct writing parallelism of laser direct writing is improved; the device is suitable for writing high-density high-precision large-sized diffractive optical elements.

Description

technical field [0001] The invention relates to laser direct writing technology, in particular to a laser direct writing device based on a Damman grating. Background technique [0002] Large-size diffraction gratings have more and more applications in high-power laser and chirped pulse compression technology, and are the core key optical devices in optical systems and scientific instruments such as large astronomical telescopes and inertial confinement fusion laser ignition systems. The preparation of diffractive optical components with large size, high precision, and high-power laser applications has become an urgent problem to be solved. Microelectronics processing technology has made great progress in the field of fabrication of diffractive optical elements. As a new type of technology in microelectronic processing technology, laser direct writing technology has received more and more attention, and the development of laser direct writing technology is becoming more and ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/58
CPCG02B27/58G03F7/2053G03F7/704
Inventor 王津周常河贾伟谢永芳赵冬项长铖
Owner JINAN UNIVERSITY