A Fast Complementary Method for Mosaic Stitching

A mosaic and compensation technology, which is used in photomechanical processing of originals for opto-mechanical processing, photo-engraving process of pattern surface, instruments, etc. It can solve the problem that the machine cannot quickly adjust the compensation, the splicing Mura phenomenon is aggravated, and the production efficiency is reduced. and other problems to achieve the effect of improving the splicing Mura phenomenon, reducing the production process and production cost, and improving production efficiency

Active Publication Date: 2020-06-30
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a fast compensation method for mosaic splicing, which can solve the problem that in the case of poor mosaic splicing accuracy, it is impossible to confirm which mosaic area the area with poor accuracy belongs to according to the graph, so the machine cannot perform fast Adjusting the compensation value leads to technical problems such as reduced production efficiency and aggravated splicing Mura phenomenon

Method used

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  • A Fast Complementary Method for Mosaic Stitching
  • A Fast Complementary Method for Mosaic Stitching
  • A Fast Complementary Method for Mosaic Stitching

Examples

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Embodiment 1

[0043] Take the 8.5th generation line mask mosaic splicing as an example, such as Figure 5 , Image 6 , Figure 7 As shown, the present embodiment provides a fast compensation method for mosaic splicing. The marking method adopted in this embodiment is to design the smallest unit constituting the first mosaic area 11 as a special pattern, and the fast compensation method Specifically include the following steps:

[0044] S101: forming a first mosaic area 11 and a second mosaic area 12;

[0045]A first mosaic area 11 and a second mosaic area 12 are respectively formed, and the first mosaic area 11 and the second mosaic area 12 are complementary, so that a complete figure can be formed during subsequent splicing. Since there is a difference in alignment accuracy between the first mosaic area 11 and the second mosaic area 12, after the first mosaic area 11 and the second mosaic area 12 are formed, it is judged that the first mosaic area 11 , the contrast accuracy of the seco...

Embodiment 2

[0055] Take the 8.5th generation line mask mosaic splicing as an example, such as Figure 8 , Figure 9 , Figure 10 As shown, the present embodiment provides a fast compensation method for mosaic splicing. The marking method adopted in this embodiment is to design the smallest unit constituting the second mosaic area 22 as a special pattern, and the fast compensation method Specifically include the following steps:

[0056] S201: forming a first mosaic area 21 and a second mosaic area 22;

[0057] Such as Figure 9 As shown, a first mosaic area 21 and a second mosaic area 22 are respectively formed, and the first mosaic area 21 and the second mosaic area 22 are complementary, so that a complete figure can be formed during subsequent splicing. Since there is a difference in alignment accuracy between the first mosaic area 21 and the second mosaic area 22, after the first mosaic area 21 and the second mosaic area 22 are formed, it is judged that the first mosaic area 21 , ...

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Abstract

A fast imputation method for use in mosaic stitching. By designing a special mosaic pattern on the smallest unit of a pattern of a first mosaic area or a second mosaic area formed, fast adjustment and imputation are implemented in a case of poor mosaic stitching precision, at the same time as display effects are ensured and without incurring additional manufacturing process and equipment, an improvement is made on the phenomenon of stitching mura, production efficiency is increased, and, a manufacturing process and production costs for a liquid crystal panel are reduced.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a fast compensation method for mosaic splicing. Background technique [0002] Because large-size LCD TVs can bring more audio-visual impact, they are increasingly favored by LCD panel manufacturers. In the traditional 8.5-generation line to produce LCD panels larger than 55 inches, since the size of the panel is larger than the effective exposure area of ​​the photomask, photomask splicing technology is required. Mosaic splicing is a mask splicing technology that transforms sharp splicing lines into fuzzy splicing lines. Since the unevenness of the panel picture quality (Mura phenomenon) caused by mosaic splicing is relatively slight and there is no special functional requirement for the exposure machine, so in It has been widely used in the production of large-size panels. [0003] In the actual production process of traditional mosaic stitching, the two mosaic areas are comp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1333G03F1/38
CPCG02F1/1333G03F1/38
Inventor 戴文
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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