Display substrate, manufacturing method thereof, display panel and display device
A technology of a display substrate and a manufacturing method, which are applied in the fields of display devices, display substrates and manufacturing methods thereof, and display panels, can solve the problems of the influence of the yield rate of display devices, the large step difference at the via holes of the film layer, etc., so as to avoid the liquid sealing effect, Good film quality, good for continuity and uniformity
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[0039] In order to further explain the display substrate and the manufacturing method thereof, the display panel, and the display device provided by the embodiments of the present invention, a detailed description will be given below in conjunction with the accompanying drawings of the specification.
[0040] As described in the background art, existing display substrates generally include a thicker film layer. When a film layer via is formed in the film layer, such as figure 1 The film vias with a size of a×b shown in the section will have the following problems:
[0041] 1. The size of the produced film via hole is limited.
[0042] 2. The depth of the film layer via hole is large, and other film layers formed in the film layer via hole are prone to breakage or poor film uniformity.
[0043] In more detail, such as figure 2 with image 3 As shown, exemplarily, the display substrate includes: a base substrate 1, and a first insulating layer 2, an active layer 3, a first conductive pa...
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