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Coating method and coating device

A technology of film layer and mask, which is applied in the field of coating method and coating device, and can solve the problems of low production efficiency and long time consumption

Active Publication Date: 2021-01-26
HKC CORP LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The above steps are numerous and time-consuming, and the production efficiency is low

Method used

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  • Coating method and coating device

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Embodiment Construction

[0036] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0037] figure 1 It is a flow chart of the coating method in one embodiment. The method includes the following steps S110-S140.

[0038] S110 : Prepare a charged mask plate. The mask plate is charged for use with the metal target in step S120, so that an electric field force is generated between the mask plate and the metal target.

[0039] S120: Prepare a metal target. The metal target contains metal element particles, and the specific processing of the metal target can make the metal element particles overflow from the surface, so that the metal target is charged, and...

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Abstract

The invention relates to a film coating method and a film coating device, wherein the film coating method includes: preparing a charged mask and a metal target; placing a substrate between the mask and the metal target; making the The metal ions in the metal target are adsorbed on the substrate under the action of the electric field force, and form a film layer. The steps of the present invention are simple and easy to operate, using the electric field force between the mask plate and the metal target, the metal ions in the metal target are adsorbed on the substrate to form the required film layer, saving coating, exposure, and development Steps such as etching, film stripping and the like improve the production efficiency of the substrate and save the production cost.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a coating method and a coating device. Background technique [0002] The liquid crystal panel of the display device mainly includes an array substrate, a color filter substrate opposite to the array substrate, and a liquid crystal layer arranged between the color filter substrate and the array substrate. [0003] During the processing of the array substrate, it is necessary to form a film layer with a specific pattern on it. The step of forming the film layer on the substrate includes: coating the film layer on the substrate; exposing and developing the coated film layer. and etching; and stripping the uppermost photoresist layer. The above-mentioned steps are numerous and time-consuming, and the production efficiency is low. Contents of the invention [0004] Based on this, it is necessary to address the above-mentioned problems and provide a coating method to improve the p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/34C23C14/14
CPCC23C14/042C23C14/14C23C14/345
Inventor 郑建升
Owner HKC CORP LTD