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Multi-channel ion source generator

A technology for generating devices and ion sources, applied in the field of ion sources, can solve the problems of high price, complex structure, poor stability, etc.

Active Publication Date: 2021-04-20
深圳富联智能制造产业创新中心有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages are: complex structure, expensive price, poor stability, low ion beam current emitted, and uneven energy distribution of ions, etc.

Method used

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Embodiment Construction

[0044] In order to make the purpose, technical solution and advantages of the present invention clearer, the present invention will be clearly and completely described below in conjunction with the accompanying drawings and specific embodiments. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them.

[0045] Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0046] It should be noted that when a component is said to be "fixed" to another component, it can be directly on the other component or there can also be an intervening component. When a component is said to be "connected" to another component, it may be directly connected to the other component or there may be intervening components at the same time. When a component is said to be "set on" another c...

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PUM

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Abstract

The invention relates to a multi-channel ion source generating device, comprising: a thermal electron generator and an ionization chamber connected with the thermal electron generator, the thermal electron generator can generate and deliver thermal electrons to the ionization chamber, the The side wall of the ionization chamber is provided with a plurality of independent inlet channels and ejection channels corresponding to the inlet channels one by one. The thermal electrons generated by the thermal electron generator or the ions generated by the ionization chamber can pass through multiple Each of the injection channels emits.

Description

technical field [0001] The invention relates to the technical field of ion sources, in particular to a multi-channel ion source generating device. Background technique [0002] Ion Beam Assisted Deposition (IAD) method for short is a coating technology developed in the mid-1980s. It uses an ion beam to apply a certain working gas to the substrate while thermally evaporating the coating. Ion bombardment has been widely used in modern high-quality, difficult and high-efficiency coating production. [0003] As an ion beam assisted deposition device, the ion source plays a decisive role in the process of changing the composition and structure of the deposited film. Its working principle is that after the cathode heating wire is energized, it generates heat and emits heat, and the hot electrons move toward the anode under the pull of the anode positive voltage. The electric field in the direction provides continuous energy replenishment. [0004] Ion sources are generally divi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
Inventor 朱岩王文宝周敏李军旗
Owner 深圳富联智能制造产业创新中心有限公司