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Etchant composition for silver thin layer and ehting method and mehtod for fabrication metal pattern using the same

A technology of composition and etching solution, applied in the direction of surface etching composition, chemical instrument and method, etc., can solve the problems such as etching solution composition that has not been proposed yet, and achieve the effect of excellent etching straightness and uniformity

Active Publication Date: 2019-05-24
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in this technical field, there is still a demand for an etchant composition capable of improving the etching properties for silver, and active research has been conducted in response to the request, but no etchant composition having significantly improved etching properties compared with the prior art has been proposed. thing

Method used

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  • Etchant composition for silver thin layer and ehting method and mehtod for fabrication metal pattern using the same
  • Etchant composition for silver thin layer and ehting method and mehtod for fabrication metal pattern using the same
  • Etchant composition for silver thin layer and ehting method and mehtod for fabrication metal pattern using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 11 and comparative example 1 to 12

[0062] A silver etchant composition was prepared by mixing the corresponding components at the contents described in Table 1 below.

[0063] [Table 1]

[0064] (unit weight%)

[0065]

experiment example 1

[0066] Experimental example 1. The performance test of silver etchant composition

[0067] An ITO / Ag / ITO triple film was formed on a substrate, and an etching process was performed using a jet etching experimental device (model name: ETCHER (TFT), SEMES). Add the above-mentioned silver etching solution compositions of Examples 1 to 11 and Comparative Examples 1 to 12 respectively into the experimental equipment, set the temperature to 40°C and then raise the temperature, and then when the temperature reaches 40±0.1°C, perform the above steps. The etching process of the ITO / Ag / ITO triple film is described. The total etching time was set to 60 seconds and implemented. In the experiment, after evaluation was performed with the silver etchant composition used for the initial time (0 time), 12 hours and 24 hours later, re-evaluation was performed with the same silver etching composition.

[0068] 1. Measuring Wiring Loss

[0069] Regarding the loss of the wiring (or reflective...

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Abstract

The present invention relates to a silver etching solution composition, an etching method using the same, and a method of forming a metal pattern, the silver etching solution composition comprising 30to 70% by weight of phosphoric acid, 2 to 9 by weight with respect to the total weight of the composition % of nitric acid, 0.1 to 9% by weight of the acetate compound, 0.1 to 10% by weight of ferricnitrate, and the balance of the total weight of the composition to 100% by weight of water.

Description

technical field [0001] The present invention relates to a silver etchant composition, an etching method using the same and a method for forming a metal pattern. More specifically, the silver etchant composition contains 30 to 70% by weight of phosphoric acid relative to the total weight of the composition , 2 to 9% by weight of nitric acid, 0.1 to 9% by weight of an acetate compound, 0.1 to 10% by weight of ferric nitrate and water in the balance making the total weight of the composition 100% by weight. Background technique [0002] With the advent of the true information age, the field of displays for processing and displaying a large amount of information is rapidly developing, and accordingly, various flat panel displays have been developed and attracted attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid crystal display device: LCD), plasma display devices (Plasma Display Panel device: PDP), field emission displ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/30C23F1/02C09K13/06
CPCC09K13/06C23F1/02C23F1/30
Inventor 金镇成金宝衡金兑勇
Owner DONGWOO FINE CHEM CO LTD
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