Silver etchant composition, etching method using same, and metal pattern forming method
A technology of composition and etching solution, which is applied in the direction of surface etching composition, chemical instrument and method, etc., can solve the problems such as the composition of etching solution that has not been proposed, and achieve the effect of excellent etching straightness and uniformity
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Embodiment 1 to 11 and comparative example 1 to 12
[0062]Silver etching liquid compositions were prepared by mixing the respective ingredients as described below in Table 1.
[0063][Table 1]
[0064](unit weight%)
[0065]
experiment example 1
[0066]Experimental example 1. Performance test of silver etching liquid composition
[0067]A ITO / Ag / ITO triple film is formed on the substrate, and an etching process is carried out using an experimental device (model name: ETCHER (TFT), SEMES) of the injection. The silver etching liquid compositions of Examples 1 to 11 and Comparative Examples 1 to 12 were added to the experimental apparatus, and the temperature was set to 40 ° C, and then the temperature was performed when the temperature reached 40 ± 0.1 ° C. Etching step of ITO / Ag / ITO triple film. The total etch time is set to 60 seconds. In the experiment, after evaluation using the silver etching liquid composition using the initial time (0 time), the resolution composition was carried out using the same silver etch composition after 12 hours and 24 hours, respectively.
[0068]Wiring loss
[0069]Regarding the loss of the wiring (or reflective film), the wiring loss is measured by measuring the single-side etch distance (S / ...
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