Silver etchant composition, etching method using same, and metal pattern forming method

A technology of composition and etching solution, which is applied in the direction of surface etching composition, chemical instrument and method, etc., can solve the problems such as the composition of etching solution that has not been proposed, and achieve the effect of excellent etching straightness and uniformity

CN109797397BActive Publication Date: 2021-05-04DONGWOO FINE CHEM CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2021-05-04

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Abstract

The present invention relates to a silver etchant composition, an etching method utilizing it and a method for forming a metal pattern. The silver etchant composition contains 30 to 70% by weight of phosphoric acid, 2 to 9% by weight relative to the total weight of the composition. % nitric acid, 0.1 to 9% by weight of an acetate compound, 0.1 to 10% by weight of ferric nitrate and the balance of water making the total weight of the composition 100% by weight.
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Description

Technical field

[0001] The present invention relates to a silver etching liquid composition, a method of forming a method of etching and forming a metal pattern, wherein the silver etching liquid composition comprises 30 to 70% by weight phosphoric acid relative to the total weight of the composition. , 2 to 9% by weight of nitric acid, 0.1 to 9% by weight of a acetate compound, 0.1 to 10% by weight of iron nitrate, and a total weight of the composition into 100% by weight of water.Background technique

[0002] With the rapid development of the display of a large amount of information, a variety of flat panel displays are developed accordingly, and more attention is developed accordingly.

[0003] As an example of such a flat panel display device, a liquid crystal display device (PLASMA Display Panel Device: PDP), a field transmitting display device: FED, electricity Electuminescencedisplay Device: ELD), Organic Light Emitting Diodes: OLED, etc., which is not only a computer and mobile phone ...

Examples

Embodiment 1 to 11 and comparative example 1 to 12

[0062]Silver etching liquid compositions were prepared by mixing the respective ingredients as described below in Table 1.

[0063][Table 1]

[0064](unit weight%)

[0065]

experiment example 1

[0066]Experimental example 1. Performance test of silver etching liquid composition

[0067]A ITO / Ag / ITO triple film is formed on the substrate, and an etching process is carried out using an experimental device (model name: ETCHER (TFT), SEMES) of the injection. The silver etching liquid compositions of Examples 1 to 11 and Comparative Examples 1 to 12 were added to the experimental apparatus, and the temperature was set to 40 ° C, and then the temperature was performed when the temperature reached 40 ± 0.1 ° C. Etching step of ITO / Ag / ITO triple film. The total etch time is set to 60 seconds. In the experiment, after evaluation using the silver etching liquid composition using the initial time (0 time), the resolution composition was carried out using the same silver etch composition after 12 hours and 24 hours, respectively.

[0068]Wiring loss

[0069]Regarding the loss of the wiring (or reflective film), the wiring loss is measured by measuring the single-side etch distance (S / ...