PECVD film thickness automatic statistical compensation system

A technology of statistical compensation and film thickness, which is applied in the direction of gaseous chemical plating, coating, electrical components, etc., can solve the problems of difficult to obtain film thickness and high defect rate of products, and achieve the effect of reducing color difference film and avoiding debris

Active Publication Date: 2019-05-28
TONGWEI SOLAR ENERGY CHENGDU CO LID
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the film thickness in the PECVD process in the prior art is difficult to be timely and effectively monitored, resulting in a high product defect rate, and to provide a PECVD film thickness automatic statistical compensation system with higher quality finished silicon solar cells

Method used

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  • PECVD film thickness automatic statistical compensation system

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] A PECVD film thickness automatic statistical compensation system, including PECVD furnace tube equipment, automatic loading and unloading equipment, is characterized in that it also includes an ATM system and a central control computer; the ATM system is used to collect PECVD furnace tube equipment and automatic loading and unloading equipment. The film thickness data of solar cells transmitted between them, and the collected film thickness data are transmitted to the central control computer; the central control computer is used to calculate the compensation time required for the solar cell coating process in the PECVD furnace tube equipment and The time is sent to the PECVD furnace tube equipment for process compensation.

Embodiment 2

[0044] On the basis of Embodiment 1, the ATM system includes a film thickness acquisition module and a signal transmission module, and the film thickness acquisition module collects the film thickness data of each solar cell; the signal transmission module collects the film thickness collected by the film thickness acquisition module All the thickness data are sent to the central control computer; the central control computer also includes a communication module and a data processing module. The communication module is used to collect the film thickness data transmitted by the ATM system and the manually set film thickness control center value and film thickness control line. and the control number of abnormal film thickness; the data processing module processes the collected film thickness data on the basis of the set film thickness control center value, film thickness control line and abnormal film thickness control number; the communication module then The data processed by ...

Embodiment 3

[0046] On the basis of the above embodiments, when the number of abnormal film thickness slices exceeds the control number of abnormal film thickness slices, the PECVD furnace tube equipment will not perform process time compensation.

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Abstract

The invention discloses a PECVD film thickness automatic statistical compensation system, belongs to the field of silicon solar cell manufacturing, and aims to solve the problem of high reject ratio of products caused by difficulty in timely and effectively monitoring the film thickness in a PECVD (Plasma Enhanced Chemical Vapor Deposition) process in the prior art. The PECVD film thickness automatic statistical compensation system comprises PECVD furnace tube equipment and automatic sheet loading and unloading equipment, and is characterized by further comprising an ATM system and a centralcontrol computer, wherein the ATM system is used for acquiring solar cell film thickness data transmitted between the PECVD furnace tube equipment and the automatic sheet loading and unloading equipment and transmitting the acquired film thickness data to the central control computer; and the central control computer is used for calculating the compensation time required by a solar cell coating process in the PECVD furnace tube equipment and sending the time to the PECVD furnace tube equipment for process compensation. According to the invention, the film thickness data is measured in time, the complete monitoring of the change of the film thickness of the solar cell is completed, the process time can be automatically adjusted, and the overall finished product quality of the solar cell isimproved.

Description

technical field [0001] The invention belongs to the field of silicon solar cell manufacturing, and in particular relates to an automatic statistical compensation system for PECVD film thickness. Background technique [0002] In the production of solar cells, there is a process called PECVD process. The function of PECVD process is to deposit a layer of silicon nitride film on silicon solar cells to reduce the reflectivity of sunlight and improve the conversion efficiency of the cells. In this process, because the PECVD furnace tube equipment uses graphite boats as the carrier of the anti-oxidation layer on the cells, the graphite boat will accumulate a silicon nitride layer on the boat body as the number of times of use increases, and this silicon nitride layer will affect The electrical conductivity of the battery sheet in the graphite boat will affect the overall uniformity of the coating. If the film thickness is not effectively monitored in time, it will eventually cause...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L31/18C23C16/52
CPCY02P70/50
Inventor 戴睿哲袁桃生刘赖生冷德成潘金亮蒋梅
Owner TONGWEI SOLAR ENERGY CHENGDU CO LID
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