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Method for measuring HF etching resistant performance of glass

A technology of etching resistance and glass, which is applied in the field of measuring glass HF etching resistance, and can solve problems such as indistinguishability

Inactive Publication Date: 2019-07-23
BENGBU CHINA OPTOELECTRONIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 2. There is a slight difference in chemical composition between the tin surface and the non-tin surface of float glass, resulting in a difference in the glass's resistance to HF acid etching. The weight loss method cannot distinguish this difference

Method used

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Embodiment Construction

[0030] The invention provides a method for measuring the HF etching resistance of glass, comprising the following steps:

[0031] (1) Cut 50mmx100mm glass samples from different parts of the glass substrate perpendicular to the float direction;

[0032] (2) Use absolute ethanol to clean the glass sample and then rinse the glass with pure water to remove stains on the glass surface and prevent stains from affecting the test results;

[0033] (3) Use an etch-resistant film to paste half of the tin surface of the glass along the center line of the glass parallel to the short side of the glass;

[0034] (4) Use an etch-resistant film to affix the air surface of the glass parallel to the short side of the glass along the center line of the glass;

[0035] (5) Dry the glass at 85°C, cool to 40°C, and keep for 5 minutes;

[0036] (6) Etching solution volume ratio: HF: H 2 O=2:8, put it in a polytetrafluoroethylene (or lead) container, put it in a water bath, and keep the temperatu...

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Abstract

The invention discloses a method for measuring the HF etching resistant performance of glass. An etching resistant film is coated or stuck on the surface of glass; the glass surface covered by the film is prevented from being etched by etching solution; the whole glass is put in the etching solution; the glass surface, which is not covered by the etching resistant film, is etched by the etching solution; because of protection of the film, the glass surface covered by the etching resistant film is not etched by the etching solution; after etching is completed, the glass is taken out, and cleaned; the etching resistant film is peeled; the glass surface is scanned by a step profiler; the height difference between the glass surface protected by the etching resistant film and the glass surfacenot protected by the etching resistant film is measured; HF acid etching resistant data of a glass tin surface can be obtained; and the problem that the glass tin surface and an air surface cannot bedistinguished according to the original etching data can be solved.

Description

technical field [0001] The invention relates to the field of glass, in particular to a method for measuring the HF etching resistance of glass. Background technique [0002] The HF acid resistance test of glass usually uses the weight loss method, and the glass weight W before etching is weighed. 0 , put the glass into the etching solution to etch, take out the glass, wash and dry it, weigh the weight W after etching 1 ; Etching weight W = weight W before etching 0 - Weight W after etching 1 ; Etching thickness H=etching weight W / glass surface area S glass surface area S=glass length Lx glass width Wx2+ glass length Lx glass height Hx2+ glass width Wx glass height Hx2. [0003] This weight loss method has the following disadvantages: [0004] 1. The etching thickness of the weight loss method is calculated by dividing the weight by the surface area, and the accuracy depends on the accuracy of the weight and the accuracy of the length measurement; [0005] 2. The chemica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N17/00C03C15/00
CPCG01N17/00C03C15/00
Inventor 侯建伟刘文瑞朱永迁
Owner BENGBU CHINA OPTOELECTRONIC TECH CO LTD
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