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Method for measuring wavefront height, terminal equipment and storage medium

A technology of height measurement and wave front, applied in the field of measurement

Inactive Publication Date: 2021-03-02
XIAMEN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The current wave height meter is difficult to do this

Method used

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  • Method for measuring wavefront height, terminal equipment and storage medium
  • Method for measuring wavefront height, terminal equipment and storage medium
  • Method for measuring wavefront height, terminal equipment and storage medium

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Embodiment 1

[0047] Embodiment 1 of the present invention provides a method for measuring wavefront height based on a binocular camera, based on the following coordinate system:

[0048] (1) The horizontal plane is taken as the x-y plane, and the z-axis is perpendicular to the horizontal plane to construct a measurement coordinate system (x, y, z), wherein the origin of the coordinate system is taken on the still water surface. Then the vertical coordinate function of the wave surface can be expressed as z=ζ(x,y). The purpose of this embodiment is to calculate the vertical coordinate function of the wavefront.

[0049] (2), define the pixel coordinate system of the first CCD (CCD1) image as (x1, y1), the pixel coordinate system of the second CCD (CCD2) image as (x2, y2), the coordinate system origin of two coordinate systems are all is the projection of the optical axis of the lens on the CCD chip.

[0050] (3), define the lens frame coordinate system (x', y', z') as the spatial coordina...

Embodiment 2

[0099] The present invention also provides a wavefront height measurement terminal device, including a memory, a processor, and a computer program stored in the memory and operable on the processor, and the present invention is realized when the processor executes the computer program Steps in the above method embodiment of Embodiment 1.

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Abstract

The present invention relates to a wavefront height measurement method, terminal equipment and storage medium, the method comprising: S1: collecting wavefront images through a binocular camera; S2: dividing the first image into grids; S3: calculating the difference between the second image and Grid paired grids of the first image; S4: Calculate the pixel coordinates of all pairs of bright spots in each paired grid; S5: According to the pixel coordinates of each pair of bright spots, calculate the pair of bright spots in the lens frame coordinate system (x ', y', z'); S6: transform the coordinates of the bright spot pair into the coordinates in the measurement coordinate system (x, y, z); S7: use the interpolation algorithm to calculate the vertical coordinate ζ(x, y) is the wave height. The invention adopts two lenses to collect the image of the three-dimensional wave surface, and can simultaneously measure the three-dimensional coordinate information of multiple points on the wave surface, thereby obtaining the height of each point on the wave surface.

Description

technical field [0001] The invention relates to the field of measurement technology, in particular to a method for measuring wavefront height, terminal equipment and a storage medium. Background technique [0002] In the experimental research and on-site observation in the fields of marine engineering, coastal engineering, ship engineering, etc., wave height meters (wave meters) are used to measure the height of waves. At present, the commonly used wave height meters include: optical wave meter, acceleration measurement, hydraulic wave meter, acoustic wave meter, resistive wave height meter, etc. But these wave height meters are based on single-point measurement technology. Wave height information at multiple points cannot be given at the same time. When studying the interaction between waves and structures, it is often necessary to obtain wave height information at multiple locations simultaneously. It is difficult for current wave height meters to do this. Contents of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06T7/00G06T7/41G06T7/62G01F23/00G01F23/292
CPCG06T7/0002G06T7/41G06T7/62G01F23/292G06T2207/10004G06T2207/30181G01F23/802
Inventor 刘春嵘刘波
Owner XIAMEN UNIV OF TECH