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Light source of exposure machine

A technology of exposure machine and light source, which is applied in the fields of optomechanical equipment, microlithography exposure equipment, photolithography process exposure device, etc., and can solve the problem that high precision and high resolution cannot be satisfied.

Pending Publication Date: 2019-10-25
广东科视光学技术股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the rapid development of the electronics industry, especially home appliances such as mobile phones, flat-panel TVs, and cameras, as well as micro-weapons such as micro-robots, micro-aircraft, and micro-torpedoes, it has been shown that high-precision and high-resolution LED exposure machines have broad application prospects and Huge application potential, but so far, the existing LED exposure machine can not meet the needs of high-precision high-resolution (50μm) PCB

Method used

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  • Light source of exposure machine
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Embodiment Construction

[0031] The present invention will be further described below in conjunction with accompanying drawing:

[0032] Such as figure 1 As shown in , a light source of an exposure machine is sequentially provided with a light source 1, a parallel light component 2, and an optical path correction component 3;

[0033] The light path of the light source 1 passes through the parallel light component 2 and the light path correction component 3 in sequence; after the light from the light source 1 passes through the parallel light component 2, a parallel light path is formed, and then the light path is corrected by the light path correction component 3;

[0034] The optical path direction of the parallel light assembly 2 is parallel to the central axis of the light transmission part 30 of the optical path correction assembly 3, and the parallel light assembly 2 is used to regularize the optical path of the light source so as to form a quasi-parallel optical path; so that the light can be b...

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Abstract

The invention relates to a light source of an exposure machine, which is sequentially provided with a light source, a parallel light assembly and a light path correction assembly, wherein the light path of the light source sequentially passes through the parallel light assembly and the light path correction assembly; the light path direction of the parallel light assembly is parallel to the central axis of the light path correction assembly; the side wall of a light transmission part of the light path correction assembly is provided with a plurality of annular grooves; and the connecting lineof the centers of the annular grooves is parallel to the central axis of the light path correction assembly. The beneficial effects are that the light path is corrected in a spiral mode, so that the light beam of an LED is enabled to be pure and free of stray light after being optically condensed; and the optical modules are arranged into a rectangle or an appropriate rectangle in an array mode toform an area array light source with high energy and high accuracy.

Description

technical field [0001] The invention belongs to the field of PCB manufacturing equipment, in particular to a light source mechanism of an exposure machine. Background technique [0002] In the printed circuit board (PCB board) manufacturing process, one of the most critical processes is to transfer the negative image to the substrate. First coat a layer of photosensitive material (such as liquid photosensitive glue, photosensitive resist dry film, etc.) on the substrate, and then irradiate the photosensitive material coated on the substrate to change its solubility. The resin in the unphotosensitive part is not polymerized, and dissolves under the action of the developer, and the photosensitive material in the photosensitive part undergoes a polymerization reaction and solidifies to form an image on the substrate. This process is exposure, that is, in the production of printed circuit boards. Completed process. [0003] In the manufacturing equipment of PCB and microelectr...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/2008G03F7/70075G03F7/7015
Inventor 陈志特王华高剑曾雪华
Owner 广东科视光学技术股份有限公司