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Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and program

A technology of control device and exposure device, applied in the direction of exposure device, optical element, microlithography exposure equipment, etc.

Active Publication Date: 2019-11-08
NIKON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

There is room for improvement with regard to the intensity quality (eg, the quality of the intensity distribution) of the aerial image formed by the light passing through the spatial light modulator

Method used

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  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and program
  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and program
  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and program

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Embodiment Construction

[0052] Hereinafter, a control device and a control method, an exposure device and an exposure method, a device manufacturing method, a data generation method, and a program of the embodiment will be described with reference to the drawings. However, the present invention is not limited to the embodiments described below.

[0053] In the following description, the positional relationship of the various components which comprise an exposure apparatus is demonstrated using the XYZ orthogonal coordinate system defined by the mutually orthogonal X-axis, Y-axis, and Z-axis. In the following description, for convenience of explanation, the X-axis direction and the Y-axis direction are respectively the horizontal direction (that is, a predetermined direction in the horizontal plane), and the Z-axis direction is the vertical direction (that is, the direction perpendicular to the horizontal plane). , essentially up and down). In addition, the rotation directions (in other words, the ti...

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Abstract

A control device for controlling a spatial light modulator that is used in an exposure device equipped with a projection optical system for projecting a pattern image onto an object and is equipped with a plurality of optical elements each having a variable state. The control method comprises: setting the state of the optical elements in a first region to a first distribution in which first optical elements in a first state and second optical elements in a second state are distributed in a first distribution pattern to thereby cause part of the light from the optical elements located in the first region to enter the projection optical system; and setting the state of optical elements in a second region to a second distribution in which the first optical elements and the second optical elements are distributed in a second distribution pattern to thereby minimize the degradation of a pattern image due to the light from the first region entering the projection optical system.

Description

technical field [0001] The present invention relates to a control device and a control method for controlling a spatial light modulator used in an exposure device, an exposure device and an exposure method using the control method, and a device manufacturing method using the exposure method , The technical field of a data generation method for generating control data (data) for controlling a spatial light modulator used in an exposure apparatus, and a program for executing the control method or the data generation method. Background technique [0002] An exposure apparatus is proposed, which is provided with a spatial light modulator (Spatial Light Modulator, SLM) in place of a mask, the spatial light modulator having a plurality of optical components (eg, microscopic components) each capable of reflecting incident light. mirror) (refer to Patent Document 1). Furthermore, there has also been proposed an exposure apparatus including a spatial light modulator including a plur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70291G02B27/0933G02B27/0927G03F7/70308G02B26/06G03F7/2008G03F7/7015G03F7/70283
Inventor 屋敷賢
Owner NIKON CORP
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