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Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and computer-readable medium

A technology of control device and exposure device, which is applied in the direction of exposure device, optical element, photomechanical equipment, etc.

Active Publication Date: 2022-03-15
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is room for improvement with regard to the intensity quality (eg, the quality of the intensity distribution) of the aerial image formed by the light passing through the spatial light modulator

Method used

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  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and computer-readable medium
  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and computer-readable medium
  • Control device and control method, exposure device and exposure method, device manufacturing method, data generation method, and computer-readable medium

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Embodiment Construction

[0066] Hereinafter, a control device and a control method, an exposure device and an exposure method, a device manufacturing method, a data generation method, and a program according to an embodiment will be described with reference to the drawings. However, the present invention is not limited to the embodiments described below.

[0067] In the following description, the positional relationship of various components constituting the exposure apparatus will be described using the XYZ rectangular coordinate system defined by the X-axis, Y-axis, and Z-axis that are perpendicular to each other. Furthermore, in the following description, for the convenience of explanation, let the X-axis direction and the Y-axis direction be the horizontal direction (that is, the predetermined direction in the horizontal plane), respectively, and the Z-axis direction is the vertical direction (that is, the direction perpendicular to the horizontal plane) , essentially in the up-down direction). A...

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Abstract

A control device and control method, exposure device and exposure method, component manufacturing method, data generation method and program product. The control device controls the spatial light modulator. The spatial light modulator is used in an exposure device provided with a projection optical system for projecting a pattern image onto an object. The spatial light modulator is provided with a plurality of optical components whose respective states can be changed. Among them, the first The state of the optical components in the region is set to a first distribution, so that a part of the light from the optical components located in the first region is incident on the projection optical system. The first distribution refers to the first optical component in the first state and the first optical component in the first region. The second optical components in the second state are distributed in a first distribution pattern, and the state of the optical components in the second area is set to the second distribution to reduce the damage caused by the light from the first area incident on the projection optical system. Deterioration of the pattern image, the second distribution means that the first optical component and the second optical component are distributed in a second distribution pattern.

Description

technical field [0001] The present invention relates to a control device and control method for controlling a spatial light modulator used in an exposure device, an exposure device and an exposure method using the control method, and a device manufacturing method using the exposure method The technical field of a data generation method for generating control data (data) for controlling a spatial light modulator used in an exposure apparatus, and a program for executing the control method or the data generation method. Background technique [0002] An exposure device is proposed, which is equipped with a spatial light modulator (Spatial Light Modulator, SLM) instead of a mask (mask), and the spatial light modulator has a plurality of optical components (such as micro Mirror (mirror)) (refer to Patent Document 1). Furthermore, an exposure apparatus including a spatial light modulator having a plurality of optical components (for example, liquid crystal elements) each capable ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70291G02B27/0933G02B27/0927G03F7/70308G02B26/06G03F7/2008G03F7/7015G03F7/70283
Inventor 屋敷賢
Owner NIKON CORP