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The overflow structure of the container

A container and overflow technology used in chemical instruments and methods, cleaning methods using liquids, semiconductor/solid-state device manufacturing, etc.

Active Publication Date: 2022-05-27
SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing alarm system detects the overflow caused by the blockage of the discharge pipeline by installing a detector on the side wall of the liquid storage container. When the detector detects the liquid on the side wall of the container, it is judged that the discharge pipeline may be blocked
However, when cleaning the wafer, the cleaning solution and water are sprayed from the respective pipelines to the wafer and the cleaning brush through the nozzle, which will cause a large amount of cleaning solution to splash on the inner wall of the container, thereby triggering the detector , resulting in false detection, the machine will alarm

Method used

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  • The overflow structure of the container
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  • The overflow structure of the container

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Embodiment Construction

[0024] In order to make the content of the present invention clearer and easier to understand, the content of the present invention is described in detail below with reference to specific embodiments and accompanying drawings, but the technical content involved in the present invention is not limited to the specific embodiments given.

[0025] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become apparent from the following description and claims. It should be noted that, the accompanying drawings are all in a very simplified form and use imprecise ratios, and are only used to facilitate and clearly assist the purpose of explaining the embodiments of the present invention.

[0026] An example provided by the present invention is image 3 As shown, inside a cleaning station contains a container that provides space for the cleaning of ...

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PUM

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Abstract

The invention discloses an overflow structure of a container, comprising: a container, the container provides an accommodating space; a discharge pipeline, located at the bottom of the container, discharges the liquid collected at the bottom of the container through the discharge pipeline; the overflow The pipeline is located on the side wall of the container. The opening of the overflow pipeline has a certain height from the bottom of the container. When the liquid at the bottom of the container accumulates to a certain amount, the liquid enters the overflow pipe; the opening of the overflow pipe also has a baffle , to block the opening of the overflow pipe to prevent the splashed droplets from entering the overflow pipe; distance. The valve is closed during normal operation. When the discharge pipe is blocked, the liquid enters the overflow pipe and accumulates again in the overflow pipe. When it reaches the height of the detector, the detector sends out an alarm; when the discharge pipe is not blocked , no liquid enters the overflow line triggering the detector to sound an alarm.

Description

technical field [0001] The invention relates to the field of semiconductor device manufacturing technology, in particular to an overflow structure for a container that is prone to overflow and false alarms in a liquid container inside a cleaning machine in a wafer cleaning process. Background technique [0002] In the semiconductor manufacturing process, wafer cleaning is an important process. After many processes, the wafer needs to be cleaned to remove residues on the surface of the wafer, such as particulate matter, organic residues, and so on. In the EBARA machine washer, each cleaning unit will have a liquid storage container, such as figure 1 As shown, the wafers are cleaned inside the container. The pure water and chemicals used to clean the wafers are drained out of the tool through the drain line below the container. Under normal circumstances, the maximum discharge volume of the discharge line is greater than the flow rate of the cleaning liquid, so that no accum...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67B08B3/08B08B13/00
CPCH01L21/67051B08B3/08B08B13/00
Inventor 代志亮
Owner SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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