Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Secondary anti-retreating structure of terminal

A terminal and housing technology, which is applied in the field of secondary anti-return structure of terminals, can solve the problems of increased contact resistance of connectors, protruding contact pieces, ablation of connectors, etc., and achieves reliable functions, simple structure and convenient operation. Effect

Pending Publication Date: 2020-01-17
CHINA AVIATION OPTICAL-ELECTRICAL TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, many connector manufacturers only use one positioning method for the contact when designing the connector. When the positioning structure fails, the contact will come out, the contact resistance of the connector will increase, and the connector will be ablated seriously.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Secondary anti-retreating structure of terminal
  • Secondary anti-retreating structure of terminal
  • Secondary anti-retreating structure of terminal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation, structure and characteristics of the secondary anti-retraction structure of the terminal proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. And its effect, detailed description is as follows.

[0035] see Figure 1-8 , which is a structural schematic diagram of each part of the secondary anti-retraction structure of the terminal of the present invention, including a housing 1, which is equipped with a contact piece 2, and the contact piece 2 is connected to the housing through the positioning claws provided on both sides. The stop fit of the inner step surface of 1 realizes the one-time positioning of the contact piece, and prevents the contact piece 2 from retreating and coming out.

[0036] Two positioning steps 5 are...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a secondary anti-retreating structure of a terminal, which comprises a shell and a contact piece assembled in the shell and used for realizing anti-retreating positioning through stopping and matching of positioning elastic claws arranged on two sides of the contact piece and a step surface in the shell, and the contact piece is also provided with two positioning steps; and the side wall of at least one tail pressing plate assembled at the tail part of the shell is provided with a positioning table which is used for realizing anti-retreating positioning of the contactpiece, and the front end of the positioning table penetrates through a through hole in the shell and is pressed on the contact piece positioning step. The contact piece is provided with the positioning elastic claws, and the contact piece can be positioned at a time through cooperation with the shell; the tail pressing plate is assembled from the side face, is positioned through a locking boss, and secondary positioning of the contact piece is achieved through cooperation of the positioning boss and the positioning steps on the contact piece, the situation that when primary positioning fails,the contact piece retreats, and consequently the connector is damaged is prevented, and the advantages of being simple in structure, convenient to operate, reliable in function, high in selectivity and the like are achieved.

Description

technical field [0001] The invention belongs to the technical field of connectors for electric vehicles, and in particular relates to a secondary anti-retraction structure of a terminal. Background technique [0002] With the gradual development of electric vehicles, their safety has attracted more and more attention from consumers, and electric vehicle ablation problems are also common. There are various reasons for their ablation, including vehicle failures caused by connector ablation , There are also various reasons for connector ablation, among which the ejection of contacts is one of the more typical reasons. [0003] At present, many connector manufacturers only use one positioning method for the contact when designing the connector. When the positioning structure fails, the contact will come out, the contact resistance of the connector will increase, and the connector will be ablated seriously. Contents of the invention [0004] In order to solve the above problem...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01R13/40H01R13/02H01R13/502
CPCH01R13/02H01R13/40H01R13/502H01R2201/26
Inventor 张培顾文武常旭阳
Owner CHINA AVIATION OPTICAL-ELECTRICAL TECH CO LTD
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com