A method for preparing unconventional refractive index mixed thin films based on magnetron sputtering

A technology of magnetron sputtering and thin film preparation, which is applied in the direction of sputtering coating, metal material coating process, vacuum evaporation coating, etc., which can solve the problems of limited application and achieve the effect of excellent durability and stability

Active Publication Date: 2022-03-29
江苏北方湖光光电有限公司
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Problems solved by technology

The materials prepared by grazing incidence electron beam evaporation are inherently deficient in porous structure, and at the same time bring problems such as stability and durability, which limit its application.

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  • A method for preparing unconventional refractive index mixed thin films based on magnetron sputtering
  • A method for preparing unconventional refractive index mixed thin films based on magnetron sputtering
  • A method for preparing unconventional refractive index mixed thin films based on magnetron sputtering

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Embodiment Construction

[0026] In order to make the purpose, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0027] The invention provides a method for preparing a non-conventional refractive index mixed film based on magnetron sputtering, comprising the following steps:

[0028] Step 1: Clean the cathode target, and install the required targets in sequence. Among them, the required target materials are as follows in order: the No. 2 target material is a tantalum target, and the No. 3 target material is a silicon target.

[0029] Step 2: Fixture treatment: In order to prevent defects such as fixture marks on the edge of the part and the fixture, sandblasting is required for the use of the fixture.

[0030] Step 3: Put the cleaned parts to be plated into the processed coating fixture, place them in the parts tray of the coating machine, press th...

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Abstract

The invention provides a method for preparing a non-conventional refractive index mixed thin film based on magnetron sputtering, which belongs to the technical field of optical thin films. In the present invention, the unconventional refractive index mixed material is deposited by pulsed DC magnetron sputtering, specifically, the cathode is used to jointly sputter tantalum and silicon targets, and a radio frequency ion source is used to ionize oxygen in the same chamber, so that they are jointly deposited on the surface of the substrate. Reaction film. Because the thin film prepared by magnetron sputtering technology has a denser structure than that of thermal evaporation, its durability and stability are better than those of thermal evaporation deposition.

Description

technical field [0001] The invention relates to the technical field of optical thin films, in particular to a method for preparing an unconventional refractive index mixed thin film based on magnetron sputtering. Background technique [0002] At present, optical films are usually designed with different refractive index film materials, different thicknesses and combinations to achieve most optical films that meet specific technical requirements. Since there are not many types of coating materials available, the selectable refractive index is very limited and is a constant, which limits the design of optical films to a certain extent, and in some cases cannot obtain the required spectral performance. Common limitations are: the width of the transmission band in anti-reflection coatings, the narrowness of the reflection band in negative filters, and the durability of the coating under harsh conditions. [0003] The unconventional refractive index film layer can better match o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/10C23C14/08C23C14/54
CPCC23C14/0036C23C14/10C23C14/083C23C14/54
Inventor 陆丹枫唐乾隆査家明李斯成汶韬
Owner 江苏北方湖光光电有限公司
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