Unlock instant, AI-driven research and patent intelligence for your innovation.

Fine mask and its manufacturing method, combined mask and display substrate

A technology of fine mask plate and manufacturing method, applied in the field of fine mask plate and its manufacturing method, combined mask plate and display substrate, which can solve the problem that the display substrate is difficult to achieve narrow borders and other problems

Active Publication Date: 2022-04-08
BOE TECH GRP CO LTD +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Embodiments of the present invention provide a fine mask and its manufacturing method, a combined mask and a display substrate, which are used to solve the problem that it is difficult to realize a narrow frame on an OLED display substrate formed by using a mask in the related art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fine mask and its manufacturing method, combined mask and display substrate
  • Fine mask and its manufacturing method, combined mask and display substrate
  • Fine mask and its manufacturing method, combined mask and display substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0040] Please refer to figure 1 , figure 1 It is a structural schematic diagram of a fine mask plate in the related art, and the fine mask plate 10 includes: a mask pattern area 11 and a non-masking area 12 arranged on the periphery of the mask pattern area 11, and the mask pattern area 11 includes: at least one display opening area 111 (the part framed by the dotted line frame) and a dummy area 112 arranged around the display opening area 111 . Wher...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a fine mask and its manufacturing method, a combined mask and a display substrate. The fine mask includes: a mask pattern area and a non-mask area arranged on the periphery of the mask pattern area, and the mask pattern The regions include: at least one first mesh pattern region, a barrier ring pattern disposed around the first mesh pattern region, and a second mesh pattern region disposed on a periphery of the barrier ring pattern. In the present invention, by setting the blocking ring pattern on the fine mask, when the fine mask and the open mask are combined, the blocking ring pattern can cover the opening area of ​​the open mask due to the manufacturing accuracy and the precision of the netting. The dimensional error caused by the open mask avoids the influence of the manufacturing accuracy of the open mask plate and the accuracy of the netting on the evaporation process. In the virtual display area, the circuit connection area on the periphery of the display area can be moved closer to the display area, thereby realizing a narrow frame.

Description

technical field [0001] The embodiments of the present invention relate to the field of display technology, and in particular to a fine mask and a manufacturing method thereof, a combined mask and a display substrate. Background technique [0002] In the related art, the light-emitting unit of the organic light-emitting diode (OLED) is usually formed by vapor deposition. The combined mask used in the vapor deposition includes a fine metal mask (Fine Metal Mask, FMM) and an open mask (Common Metal Mask) that are superimposed. Mask or Open Mask). In order to avoid the impact of the open mask manufacturing accuracy and the netting accuracy, the size of the opening area needs to be designed to be larger than the size of the display opening area (AA area) of the fine mask, so that the fine mask will not be exposed during evaporation. The display opening area of ​​the fine mask is blocked by the material of the open mask. At the same time, it is necessary to design the same grid p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24H01L51/56
CPCC23C14/042C23C14/24H10K71/164H10K71/166C23C16/042G06F1/189B05C21/005H10K59/131
Inventor 黄世雄
Owner BOE TECH GRP CO LTD