Method for improving accurate focal length of exposure machine

Abstract

The invention discloses a method for improving the accurate focal length of an exposure machine. The method comprises the following steps of: setting a figure into a mark figure of an exposure machineon a glass negative film, projecting the mark figure onto an alignment shape on a product by light of the exposure machine during exposure, and completing alignment by overlapping a mark figure projection center and an alignment shape center on the product. The design of a plurality of corners and the design of a plurality of parallel line segments are adopted in the graph, so that the center ofthe graph can be quickly and accurately grabbed; the number of the parallel line segments can be designed according to the size of the alignment shape on the product, so that the center of the line segment in the middle of the number of the parallel line segments of the precise focal length graph corresponds to the center of the alignment shape on the product, and the center of the focal length graph and the center of the alignment shape of the product can be quickly and accurately overlapped. By adopting the focal length graph, the situation that the alignment precision is reduced due to incomplete graphs caused by etching of the glass negative film graph can be avoided.

Description

technical field [0001] The invention relates to the field of exposure machines, in particular to a method for improving the precise focal length of an exposure machine. Background technique [0002] With the development of social economy, the electronics industry has also entered a stage of rapid development, and people's requirements for electronic products tend to be small, thin, and functional. Therefore, the product design stage needs to arrange finer and denser circuits. The thinner and denser product lines created a big problem for production. The original lines are thick and sparse, and the focus ability of the exposure machine is not high. Even if there is a deviation in the exposure line, it is within the tolerance range. However, the lines of the new product are thin and dense, and a high-precision exposure machine is required. However, the depth of focus of the high-precision exposure machine is narrowed to only ±30 μm, so the requirements for the focusing abili...

AI Technical Summary

Problems solved by technology

[0005] ①With the finer and denser lines, the mark pattern of the existing exposure machine cannot make the exposure machine focus accurately and efficiently, and the focal length cannot meet the production requirements, which seriously affects the accuracy of the exposure machine

[0006] ②The lines become thinner and denser. After the exposure of the existing technology, exposure deviation will occur, which will increase the tolerance of the product.

[0007] ③If serious exposure deviation occurs, the product will exceed the production specification and become a defective product, thereby reducing the yield rate

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