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Grating stitching correction method, device and grating stitching correction system

A technology of correction system and correction method, which is applied in the field of optics and can solve problems such as the inability to guarantee the accuracy of grating splicing

Active Publication Date: 2021-08-20
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, due to the different types of gratings themselves, the existing specific grating stitching methods cannot guarantee the accuracy of all types of grating stitching

Method used

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  • Grating stitching correction method, device and grating stitching correction system
  • Grating stitching correction method, device and grating stitching correction system
  • Grating stitching correction method, device and grating stitching correction system

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Embodiment Construction

[0019] In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.

[0020] In order to illustrate the technical solutions of the present invention, specific examples are used below to illustrate.

[0021] figure 1 It is a schematic flowchart of a raster mosaic correction method provided by an embodiment of the present invention. figure 2 It is a schematic block diagram of a grating splicing correction device provided by an embodiment of the present invention. ...

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Abstract

The invention discloses a grating splicing correction method, a device and a grating splicing correction system. The grating splicing correction device is applied to a grating splicing correction system. The correction method includes: adjusting one or both of the first reflection part and the second reflection part, so that the interferometer detects the first interference field and the second interference field having the same non-zero diffraction order and having different incident angles. Interference field: adjusting the second grating so that the interference fringes of the first interference field and the second interference field are consistent. The embodiment of the present invention can adjust the reflection part through the reflection part control mechanism, so that the interferometer detects two interference fields with the same non-zero diffraction order and different incident angles, and then the grating control mechanism adjusts the grating so that the two interference fields The interference fringes of the field are consistent, thereby accurately correcting the error of grating stitching.

Description

technical field [0001] The invention belongs to the field of optical technology, and in particular relates to a grating splicing correction method, a device, an interferometer system and a grating splicing correction system. Background technique [0002] With the continuous development of science and technology, in order to meet the human exploration of outer space and the exploration of clean energy laser fusion, the diffraction grating is the core component in the field of astronomy and nuclear fusion, and its size requirements are constantly increasing. At present, the size requirements for diffraction gratings in the fields of astronomy and nuclear fusion have reached the meter level or above. [0003] Currently, raster stitching is the main technique for increasing raster size. Generally, grating stitching can be divided into compensation stitching and strict stitching. Compensation stitching refers to the rotation error Δθ around the grating vector direction in the fi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J3/45
CPCG01J3/45
Inventor 糜小涛杨国军齐向东张善文于海利于宏柱丛敏江思博周敬萱
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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