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Substrate treatment apparatus, control method therefor, and storage medium

A substrate processing device and control method technology, which is applied in the direction of program control, comprehensive factory control, general control system, etc., and can solve the problems of increased operation rate or maintenance cost of substrate processing devices, etc.

Pending Publication Date: 2020-04-28
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, when a part of the components is damaged due to a sudden state change inside the chamber, the operating rate or maintenance cost of the substrate processing apparatus may increase due to the need to replace the components.

Method used

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  • Substrate treatment apparatus, control method therefor, and storage medium
  • Substrate treatment apparatus, control method therefor, and storage medium
  • Substrate treatment apparatus, control method therefor, and storage medium

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Embodiment Construction

[0032] Hereinafter, embodiments of the present invention will be described in detail with reference to the attached drawings so that those skilled in the art to which the present invention pertains can easily implement. The present invention can be realized in various forms, and is not limited to the embodiments described here.

[0033] In order to clearly describe the present invention, parts irrelevant to the present description are omitted, and the same or similar components may be assigned the same reference numerals throughout the specification.

[0034] In addition, in each embodiment, the constituent elements having the same configuration will be described only in the representative embodiment using the same reference numerals, and only the configurations different from the representative embodiment will be described in the remaining other embodiments. .

[0035] Throughout the specification, when a part is said to be "connected" to other parts, it includes not only th...

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PUM

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Abstract

The disclosure provides a substrate treatment apparatus, a control method therefor, and a storage medium. The substrate treatment apparatus comprises one or more operation elements, the substrate processing apparatus includes a processing unit controlling operation of the substrate processing apparatus, and a controller controlling independently the one or more operation elements of the substrateprocessing apparatus, monitoring operation of the processing unit, and maintaining operation states of the one or more operation elements when the operation of the processing unit is restarted or terminated.

Description

technical field [0001] The present invention relates to a substrate processing device, a control method thereof, and a storage medium, and in more detail relates to a substrate processing device, a control method thereof, and a storage medium that can be used in semiconductor manufacturing. Background technique [0002] In general, semiconductor devices may be formed on silicon wafers used as semiconductor substrates by repeatedly performing a series of manufacturing processes. [0003] Such a semiconductor device can be manufactured by a substrate processing apparatus. The general control of the conventional substrate processing apparatus can be implemented by an operation system. [0004] On the other hand, after the operating system is updated, the substrate processing apparatus may be restarted so that the updated items can be applied normally, or may be terminated unexpectedly due to failure or the like. At this time, the fieldbus driver (FD: fieldbus driver) included...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/67011H01L21/67242H01J37/3211H01J37/32449H01J37/32724H01J37/32816H01J37/3288H01L21/67253G05B19/4067G05B2219/50104G05B2219/45031Y02P90/02H01L21/67276H01L21/02G05B19/4184H01L21/67017H01J2237/3341H01J2237/332H01J2237/2485H01J2237/186
Inventor 金昇延
Owner SEMES CO LTD
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