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Preparation method of array substrate, array substrate and display device

An array substrate and base layer technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of insufficient etching depth of isolation grooves and etching loss, so as to reduce etching loss and improve isolation effect Effect

Active Publication Date: 2020-06-05
CHONGQING BOE DISPLAY TECH CO LTD +1
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  • Application Information

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Problems solved by technology

[0004] In view of the shortcomings of the existing methods, the present application proposes a method for preparing an array substrate, an array substrate, and a display device, so as to solve the problems in the prior art that the etching depth of the isolation groove is not enough or the first barrier film layer is etched by the isolation groove. The technical problem of etching loss due to the influence of etching

Method used

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  • Preparation method of array substrate, array substrate and display device
  • Preparation method of array substrate, array substrate and display device
  • Preparation method of array substrate, array substrate and display device

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Embodiment Construction

[0049] The present application is described in detail below, and examples of embodiments of the present application are shown in the drawings, wherein the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. Also, detailed descriptions of known technologies will be omitted if they are not necessary to illustrate the features of the present application. The embodiments described below by referring to the figures are exemplary only for explaining the present application, and are not construed as limiting the present application.

[0050] Those skilled in the art can understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in commonly used dictionaries, should be ...

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Abstract

The embodiment of the invention provides a preparation method of an array substrate, the array substrate and a display device, and relates to the technical field of array substrates. The preparation method comprises the following steps: arranging a metal film layer on the surface of one side, far away from a first organic film layer, of a first barrier film layer; etching the metal film layer andthe first barrier film layer which are corresponding to the area of the isolation groove to be etched of the first organic film layer to form an open groove; arranging a photoresist layer on the metalfilm layer, and patterning the photoresist layer; and taking the patterned photoresist layer and the etched metal film layer as masks, and etching the area of the isolation groove to be etched of thefirst organic film layer to form the isolation groove. The embodiment of the invention is used for solving the technical problem of etching loss caused by insufficient etching depth of the isolationgroove or influence of etching of the isolation groove on the first barrier film layer in the prior art.

Description

technical field [0001] The present application relates to the technical field of array substrates. Specifically, the present application relates to a method for preparing an array substrate, an array substrate and a display device. Background technique [0002] With the rapid development of full-screen mobile phones with AA Hole (AAHole means the AA area is punched, and the AA area is the effective display area), high screen-to-body ratio has become an important development direction for major mobile phone manufacturers. At present, the full screens on the market mainly include notch screens, water drop screens and hole-digging screens. This technology can place the opening position of the front camera arbitrarily, while maintaining the overall visual effect of the ultra-narrow borders on the four sides, while hiding the front camera in the display screen, and achieving the effect of the overall full screen after the screen is turned off. The AA Hole full-screen technology ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L27/12H01L27/32
CPCH01L21/77H01L27/1259H01L27/1214H10K59/12Y02E10/549
Inventor 赵天龙
Owner CHONGQING BOE DISPLAY TECH CO LTD
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