Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method hierarchical defect positioning method based on Bert model

A positioning method and defect technology, applied in the field of one-level defect positioning based on Bert model, can solve problems such as reducing positioning accuracy, vocabulary mismatch, etc., to improve accuracy, shorten training time, and avoid gradient disappearance and gradient. The effect of the explosion problem

Active Publication Date: 2020-07-17
YANGZHOU UNIV
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a lexical mismatch between defect reports and source code files: that is, the terms used to describe defects in defect reports are different from the terms and code tokens used in source files
Therefore, the vocabulary mismatch problem will reduce the accuracy of positioning

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method hierarchical defect positioning method based on Bert model
  • Method hierarchical defect positioning method based on Bert model
  • Method hierarchical defect positioning method based on Bert model

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0059] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0060] In one embodiment, combined with figure 1 , provides a method-level defect localization method based on the Bert model, the method includes the following steps:

[0061] Step 1, build and train the Bert model;

[0062] Step 2, obtaining historical repaired defects related to the defects to be located;

[0063] Step 3, constructing a defect localization model based on the Bert model;

[0064] Step 4, constructing training samples for the defect localization model based on relevant historical repaired defects;

[0065] Step 5, using the training samples to train t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method hierarchical defect positioning method based on a Bert model. The method comprises the following steps: constructing and training the Bert model; acquiring historicalrepaired defects related to the to-be-positioned defects; constructing a defect positioning model based on the Bert model; training a defect positioning model; and predicting a defect method corresponding to the defect to be positioned by using the trained defect positioning model. According to the method provided by the invention, historical data and a deep learning technology are combined to train a defect positioning model; and meanwhile, the Bert model is used for respectively training the defect report encoder and the source code encoder, and parameters of the source code encoder in the defect positioning model are determined by using the Bert model, so that the feature extraction capability of the source code encoder in the positioning model is enhanced. Besides, by refining the related historical repaired defects, the search range of defect positioning is reduced, the positioning accuracy is improved, the purpose of positioning the software defects on the method level is well achieved, and then the software defect repairing efficiency is improved.

Description

technical field [0001] The invention belongs to the field of software maintenance, in particular to a Bert model-based method level defect location method. Background technique [0002] Software quality is critical to the success of a software project. Although there have been many software quality assurance activities (such as testing, inspection, static inspection, etc.) to improve software quality, in practice, software systems usually come with defects (bugs). For large and evolving software systems, project teams may receive numerous defect reports over an extended period of time. For example, the 2009 Eclipse project reported about 4414 bugs. [0003] After receiving and acknowledging a defect report, the project team should find the source code files that need to be changed to fix the defect. However, manually locating the files that need to be changed based on the initial defect report is usually very time-consuming and labor-intensive, especially when the number ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F11/36G06F8/41G06N3/04
CPCG06F11/366G06F8/443G06N3/045
Inventor 倪珍李斌孙小兵陈天浩
Owner YANGZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com