Wafer cassette cleaning device and control method of wafer cassette cleaning device

A technology of cleaning device and control method, which is applied in cleaning methods and utensils, chemical instruments and methods, cleaning hollow objects, etc., can solve the problems of poor cleaning effect, low cleaning efficiency, and long cleaning time of wafer boxes, and achieve improvement Cleaning efficiency and cleaning effect, avoid high temperature deformation, solve the effect of high temperature easy deformation

Active Publication Date: 2020-10-30
XUZHOU XINJING SEMICON TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the related art, the cleaning effect of the wafer box is not good, and in order to ensure the cleaning effect, it takes a lot of cleaning time, resulting in low cleaning efficiency

Method used

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  • Wafer cassette cleaning device and control method of wafer cassette cleaning device
  • Wafer cassette cleaning device and control method of wafer cassette cleaning device
  • Wafer cassette cleaning device and control method of wafer cassette cleaning device

Examples

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Embodiment Construction

[0041] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0042] The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and / or letters in different instances. This repetition is for the purpose of simplicity and clarity and does not in itself...

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PUM

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Abstract

The invention discloses a wafer cassette cleaning device and a control method of the wafer cassette cleaning device. The wafer cassette cleaning device comprises a cavity, a rotating frame, a cleaningcomponent and a temperature measuring structure, wherein a cleaning cavity is defined in the cavity, the rotating frame is rotatably arranged in the cleaning cavity and used to fix the wafer cassette, the cleaning component is arranged on the cavity and comprises a steam cleaning structure and a water cleaning structure, the steam cleaning structure is communicated with the cleaning cavity through a first nozzle to spray steam to the cleaning cavity, the water cleaning structure is communicated with the cleaning cavity through a second nozzle to spray water into the cleaning cavity, and the temperature measuring structure is used to detect the wall surface temperature of the wafer cassette. According to the wafer cassette cleaning device provided by the invention, the cleaning efficiencyand cleaning effect of the wafer cassette can be improved, while avoiding high-temperature deformation of the wafer cassette and ensuring the stability of the wafer cassette structure.

Description

technical field [0001] The invention relates to the technical field of wafer box cleaning, in particular to a wafer box cleaning device and a control method for the wafer box cleaning device. Background technique [0002] In semiconductor production, the wafer box mainly plays the role of placing and transporting wafers. In order to prevent the wafer box from polluting the wafer, the wafer box needs to be cleaned. However, in the related art, the cleaning effect of the wafer box is not good, and in order to ensure the cleaning effect, more cleaning time is required, resulting in low cleaning efficiency. Contents of the invention [0003] The present invention aims to solve at least one of the technical problems existing in the prior art. Therefore, the present invention proposes a wafer cassette cleaning device, which can improve the cleaning efficiency and cleaning effect of the wafer cassette, avoid high-temperature deformation of the wafer cassette, and ensure the stab...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B9/28B08B13/00
CPCB08B9/28B08B9/283B08B13/00
Inventor 陈建铭卢健平
Owner XUZHOU XINJING SEMICON TECH CO LTD
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