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Distributed Bragg reflector, manufacturing method and design method thereof

A technology for Bragg reflectors and manufacturing methods, which is applied to laser parts, semiconductor lasers, electrical components, etc., can solve problems such as high reflectivity, and achieve low manufacturing costs and low difficulty in epitaxy process control

Active Publication Date: 2021-11-09
武汉光谷量子技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The embodiment of the present application provides a method for manufacturing a distributed Bragg reflector to solve the technical problem in the related art that more than ten sets of periodic quarter-wavelength thin films are required to achieve high reflectivity

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  • Distributed Bragg reflector, manufacturing method and design method thereof
  • Distributed Bragg reflector, manufacturing method and design method thereof
  • Distributed Bragg reflector, manufacturing method and design method thereof

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Embodiment Construction

[0054] In order to make the purposes, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments It is a part of the embodiments of this application, but not all of them. Based on the embodiments in the present application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present application.

[0055] An embodiment of the present application provides a method for fabricating a distributed Bragg reflector, which includes the steps of: forming N groups of high refraction mirrors in the reflector layer by combining non-selective dry etching and selective wet etching A two-layer film with a ratio contrast, wherein the contrast rat...

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Abstract

The present application relates to a distributed Bragg reflector and its manufacturing method and design method. The manufacturing method of the distributed Bragg reflector includes the steps of: combining non-selective dry etching and selective wet etching, N groups of two-layer thin films with high refractive index contrast are formed in the mirror layer, wherein the refractive index contrast is greater than 2. Compared with the existing low-refractive index contrast distributed Bragg reflector, which uses ten or more sets of thin film combinations to achieve high reflectivity, the manufacturing method of the distributed Bragg reflector provided by this application uses a small number of thin films. High reflectivity can be realized, which makes the manufacturing cost lower and the epitaxial process control less difficult.

Description

technical field [0001] The present application relates to the technical field of semiconductors, in particular to a distributed Bragg reflector and its manufacturing method and design method. Background technique [0002] Distributed Bragg reflection (DBR) is a periodic structure composed of two materials with different refractive indices arranged alternately in an ABAB manner, and the optical thickness of each layer of material is 1 / 4 of the central reflection wavelength. [0003] In planar optoelectronic devices, a DBR mirror composed of two thin films with different refractive indices alternately is a common structure. The DBR mirror is composed of two materials with different refractive indices. Materials for lattice matching of the bottom, for example, for an indium phosphide (InP) substrate, available materials include InGaAsP, InAlGaAs, and the like. [0004] However, the difference in the refractive index of the InP material system is small, that is, the refractive ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/183H01S5/187
CPCH01S5/18363H01S5/18377H01S5/187
Inventor 曾磊王肇中
Owner 武汉光谷量子技术有限公司