Preparation method of flower-like silicon dioxide abrasive particles

A silicon dioxide and flower-shaped technology, applied in the direction of silicon dioxide, silicon oxide, chemical instruments and methods, etc., can solve the problem of low polishing rate of spherical silicon oxide abrasive grains, achieve more effective contact sites, and reduce surface roughness Degree, effect suitable for promotional use

Pending Publication Date: 2021-01-12
上海胶束化工有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of low polishing rate of existing sphe

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of flower-like silicon dioxide abrasive particles
  • Preparation method of flower-like silicon dioxide abrasive particles
  • Preparation method of flower-like silicon dioxide abrasive particles

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0020] A kind of preparation method of flower-shaped silica abrasive grain provided by the invention comprises the following steps:

[0021] S01: Add polyvinylpyrrolidone (PVP) into n-amyl alcohol, stir until the polyvinylpyrrolidone is completely dissolved, add absolute ethanol and 0.36M sodium citrate solution, stir until the solution becomes cloudy, then add 25wt.% ammonia water, stir And the mixed solution was heated, then slowly added tetraethyl orthosilicate (TEOS) dropwise, continued to stir, continued the reaction at a constant temperature of 70°C for 2h, sealed and cooled for 24h, and obtained flower-like silica seeds; among them, PVP, n-pentanol , absolute ethanol, 0.36M sodium citrate solution, 25wt.% ammonia water, and the mass ratio of TEOS are: 6-10: 122-244: 20: 10: 4-9: 5-10.

[0022] S02: passing 8wt.% of the water glass solution through a cation exchange resin pretreated with HCl to obtain a silicic acid solution with an activity of 2 to 3wt.%.

[0023] S03:...

Embodiment 1

[0027] This example provides a method for preparing flower-shaped silica nano-abrasive particles. The flower-shaped silica nano-abrasive particles are prepared by a dual-system microemulsion template method. The method steps are as follows:

[0028] (1) Add 6g of PVP into a three-necked flask with 300ml of n-pentanol, stir until the PVP is completely dissolved, add 25ml of absolute ethanol and 10ml of 0.36M sodium citrate solution, stir until the solution becomes cloudy, then add 5ml 25wt.% ammonia water, stirred and heated the mixed solution to 70°C, then slowly added 5ml of tetraethyl orthosilicate (TEOS) dropwise, after the dripping, continued to stir, kept the temperature at 70°C for 2h, then poured it into a beaker, Sealed and cooled overnight to obtain flower-shaped silica seeds.

[0029] (2) A certain amount of 8wt.% water glass (Na 2 SiO 3 ) solution was passed through the cation exchange resin pretreated with HCl to obtain a freshly prepared 2 wt.% active silicic ac...

Embodiment 2

[0034] This example provides a method for preparing flower-shaped silica nano-abrasive particles. The flower-shaped silica nano-abrasive particles are prepared by a dual-system microemulsion template method. The method steps are as follows:

[0035] (1) Add 7g of PVP into a three-necked flask containing 300ml of n-pentanol, stir until the PVP is completely dissolved, add 25ml of absolute ethanol and 10ml of 0.36M sodium citrate solution, stir until the solution becomes cloudy, then add 6.75 ml25wt.% ammonia water, stirred and heated the mixed solution to 70°C, then slowly added 6ml of tetraethyl orthosilicate (TEOS) dropwise, after the dripping, continued to stir, 70°C constant temperature to continue the reaction for 2h, then poured into a beaker, Sealed and cooled overnight to obtain flower-shaped silica seeds.

[0036] (2) Pass the 8wt.% water glass solution through the cation exchange resin pretreated with HCl to obtain a 3wt.% active silicic acid solution;

[0037] (3) A...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a preparation method and application of flower-like silicon dioxide nano abrasive particles. The flower-like silicon dioxide nano abrasive particles are silicon dioxide nano particles with extremely irregular shapes, and the preparation method comprises the following steps: preparing flower-like seed crystals by utilizing irregular hydrolytic condensation fracture of tetraethyl orthosilicate on the surfaces of small water drops in a water-in-oil system, and by utilizing asymmetry of the seed crystals in an oil-in-water system during silicic acid condensation growth, obtaining the flower-shaped silicon dioxide nanometer abrasive particles. Compared with conventional spherical silicon dioxide abrasive particles, the flower-like silicon dioxide nano abrasive particleshave the advantages that the material removal rate of sapphire wafers is increased by 117%, and the surface roughness after polishing can be effectively reduced.

Description

technical field [0001] The invention relates to a nano abrasive particle with irregular shape and a preparation method thereof. In particular, a flower-shaped silicon dioxide abrasive grain is used in the polishing process of sapphire wafers and belongs to the technical field of surface polishing. Background technique [0002] Sapphire, α-Al in single crystal form 2 o 3 It has a series of excellent physical and chemical properties such as high strength, high hardness, high temperature resistance, corrosion resistance, friction resistance, good light transmission performance, and good electrical insulation performance. It is widely used in windows for infrared military devices, satellite space technology, and consumer electronics. Materials, high-precision optical instrumentation, substrate materials for light-emitting diodes (LEDs) and superconducting nanostructures. In recent years, with the further increase in demand for consumer electronics industry, defense industry m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C01B33/18B82Y40/00C09K3/14
CPCC01B33/18B82Y40/00C09K3/1409C01P2004/30
Inventor 雷红徐磊雷逸凡杨小强
Owner 上海胶束化工有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products