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Preparation method of a heterojunction photodetector and photodetector

A photodetector, heterojunction technology, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problem of high detectable power (sensitivity), high-precision detection requirements that cannot be guaranteed, and detectors that cannot be implemented. Problems such as detection, to achieve the effect of flexible setting method, realizing flexibility and scale, reducing threshold and cost

Active Publication Date: 2021-03-09
武汉敏芯半导体股份有限公司
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Problems solved by technology

Therefore, the detector based on this mechanism cannot perform detection under zero bias voltage, and the dark current of the detector is not small, and the minimum detectable power (sensitivity) is large, which cannot guarantee high-end communications such as lidar, quantum communication, and atmospheric optical communication. Backhaul small signal detection in the link and other high-precision detection requirements

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[0045] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation or position indicated by "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. The relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, therefore It should not be construed as a limitation of the present invention.

[0046] In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indic...

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Abstract

The invention discloses a method for preparing a heterojunction photodetector and the photodetector. In the preparation method, a mask is provided on the patterned first material layer and the mask covers the first On the surface of the material layer except the heterojunction region, a second material layer is arranged on the substrate, and the second material layer is stacked with the first material layer in the heterojunction region, so that not only the second material layer is on the substrate The setting method above is more flexible, which avoids the need for organic-assisted stripping and transfer in the prior art to realize the stacking of two materials, and can also reduce the mask’s impact on the first material when patterning the second material layer. Therefore, the preparation method of the heterojunction photodetector provided by the present invention can realize the flexibility and scale of the preparation of the heterojunction of low-dimensional materials, and also make the preparation of the heterojunction compatible with the CMOS process, reducing the Barriers and costs of industrial fabrication of heterojunctions.

Description

technical field [0001] The invention belongs to the technical field of photodetectors, and in particular relates to a preparation method of a heterojunction photodetector and the photodetector. Background technique [0002] Low-dimensional materials have become an important support for the development of a new generation of high-performance optoelectronic devices due to their outstanding optoelectronic properties, ultra-high carrier mobility, and excellent mechanical strength. They have application potential that cannot be achieved by traditional bulk materials. However, a single low-dimensional material still cannot meet the needs of multifunctional devices in practical applications. Therefore, the idea of ​​assembling different low-dimensional materials into van der Waals heterostructures to further improve device performance has emerged as the times require. Compared with traditional semiconductor heterojunctions, van der Waals heterojunctions are no longer limited by the...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L31/109
CPCH01L31/109H01L31/18Y02P70/50
Inventor 刘应军王权兵阳红涛王任凡
Owner 武汉敏芯半导体股份有限公司
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