Glass photonic crystal selective wave absorber based on DBS algorithm

A photonic crystal and selective technology, applied in optics, instruments, mirrors, etc., can solve the problem of poor radiation cooling effect of devices, and achieve the effect of solving the problem of multi-layer loss, single material, and excellent performance

Active Publication Date: 2021-03-02
NAT UNIV OF DEFENSE TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to overcome the multi-layer problem caused by the use of multi-layer materials in the existing radiative cooling selective absorber, and the problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Glass photonic crystal selective wave absorber based on DBS algorithm
  • Glass photonic crystal selective wave absorber based on DBS algorithm
  • Glass photonic crystal selective wave absorber based on DBS algorithm

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0025]What the present invention proposes is a glass photonic crystal selective absorber based on DBS algorithm, and its periodic three-dimensional structure diagram is asfigure 1 As shown, the three-dimensional structure diagram of a unit in the periodic structure is asfigure 2 As shown, it includes optimized selection of the absorption region 1, the absorption layer 2, and the reflection layer 3.

[0026]The material of the optimized absorption region 1 is glass photonic crystal, the thickness of the optimized absorption region 1 is t=3μm; the material of the absorption layer 2 is silicon dioxide, and the thickness of the absorption layer 2 is w=11μm, the material of the reflective layer 3 is silver, and the thickness is h=0.5μm.

[0027]Silver is widely used as an ideal conductor material in the infrared band. Therefore, we coat a silver film on the bottom of the silicon dioxide absorption layer to cause the incident light waves to be effectively reflected at the position of the silver...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Sizeaaaaaaaaaa
Login to view more

Abstract

The invention belongs to a selective wave absorber applied to radiation cooling, and particularly relates to a glass photonic crystal selective wave absorber based on a DBS algorithm, so as to achievethe purpose of radiation cooling. The wave absorber is composed of periodic structures, and one periodic structure unit comprises an optimized selective absorption area, an absorption layer and a reflection layer. According to the selective absorber designed on the basis of the DBS algorithm, the problem of multilayer loss in the process of manufacturing the multilayer radiation cooling selectiveabsorber is solved, the problem that the effect of optimizing the radiation cooling selective absorber through the algorithm is not ideal is solved, and the selective absorber which is excellent in performance, single in material and capable of being produced in batches is achieved.

Description

technical field [0001] The invention belongs to a selective wave absorber applied to radiation cooling, in particular to a glass photonic crystal selective wave absorber based on a DBS algorithm, thereby realizing the purpose of radiation cooling. Background technique [0002] The practice of radiative cooling dates back centuries and was not really systematically studied until the 20th century. Studies have shown that in the atmosphere, for light waves of 8-13 μm, its radiation energy can be directly transmitted to 3K outer space (Kelvin temperature system). Studies have shown that using the black body radiation formula, it can be derived that high emission is equivalent to high absorption. Therefore, the use of selective absorbers to achieve high absorption (high emission) in this band is expected to provide a feasible solution to the problem of global warming. In addition, high reflectivity (up to 100%) of the device in the band below 8 μm is also necessary, which aims ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/00G02B5/08G02B1/00
CPCG02B5/003G02B5/0808G02B1/005
Inventor 姜鑫鹏杨俊波马汉斯
Owner NAT UNIV OF DEFENSE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap