Parameter consistency control method and device based on precision and distribution conversion correction
A precision and consistency technology, applied in the field of parameter consistency control methods and devices based on precision and distribution conversion correction, can solve the problems of strict MAD method, ignoring outliers, loose control limits of PAT method, etc., to achieve optimization Measurement system analysis data acquisition and calculation methods, correction of non-applicable defects, enhancement of effectiveness and range of effects
Pending Publication Date: 2021-03-19
CHINA ACADEMY OF SPACE TECHNOLOGY
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If the 3sigma method is directly applied to these parameters, a large number of normal products will be eliminated, and at the same time, the real outliers at the other end may be ignored, resulting in false detection and missed detection.
[0004] 2. This method does not consider the influence of parameter measurement system precision on consistency control
[0005] 3. This method does not pay attention to the fluctuation state between different batches of products
However, the control limit of this method is too strict, and it does not fully adapt to the skewed distribution. At the same time, considering that the parameter test has been analyzed by the measurement system, there are usually no extreme outliers, and the number of batches is large, so the MAD method is not used for meta-analysis. Device parameter consistency control
image 3 The result of consistent control of the capacitance of a capacitor by different control methods, it can be seen that the control limit of the PAT method is too loose, and the MAD method is too strict
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[0069] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0070] refer to Figure 4 , shows a flow chart of the steps of a parameter consistency control method based on precision and distribution conversion correction provided by an embodiment of the present invention, as shown in Figure 4 As shown, the method may specifically include the following steps:
[0071] Step 101: Sampling and collecting repeatability test data and reproducibility test data of device parameters.
[0072] Step 110 specifically inc...
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The invention provides a parameter consistency control method and device based on precision and distribution conversion correction. The method comprises the steps that repeatability test data and reproducibility test data of device parameters are sampled and collected; the precision of parameters corresponding to the repeatability test data and the reproducibility test data is calculated; and batch correction is carried out on the parameters corresponding to the precision in the preset range. According to the method, the application range is wider, component parameter outliers of various distribution types can be effectively recognized, the control limit is closer to the parameter intrinsic distribution edge, and false detection and missing detection caused by non-normal distribution are avoided to the maximum extent.
Description
technical field [0001] The invention relates to the field of software, in particular to a parameter consistency control method and device based on precision and distribution conversion correction. Background technique [0002] There are mainly two control methods for parameter consistency in the quality control of semiconductor components: 3sigma method and Part Average Testing (PAT). Among them, the 3sigma method widely used at present uses the (mean ± 3 times standard deviation) of the parameter test results of the whole batch of products as the control limit for identifying outliers. There are some problems with this approach: [0003] 1. The default parameter of this method is x~N(μ,σ 2 ), but in fact, due to the complex mechanism and process of semiconductor components, many parameters do not conform to the normal distribution assumption, such as figure 1 The asymmetric distribution in is quite common in various types of components. The tails of these distributions ...
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IPC IPC(8): G06F17/18G06N7/00
CPCG06N7/00G06F17/18
Inventor 李剑焘张红旗汪悦张松范壮壮常明超唐章东张大宇汪洋崔华楠王贺
Owner CHINA ACADEMY OF SPACE TECHNOLOGY