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Method, device and storage medium for light source mask optimization

A light source and mask technology, applied in the field of light source mask optimization, can solve the problems of large computing resources and time

Active Publication Date: 2021-08-06
全芯智造技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the current SMO process consumes a lot of computing resources and time

Method used

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  • Method, device and storage medium for light source mask optimization
  • Method, device and storage medium for light source mask optimization
  • Method, device and storage medium for light source mask optimization

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Embodiment Construction

[0026] Embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although certain embodiments of the present disclosure are shown in the drawings, it should be understood that the disclosure may be embodied in various forms and should not be construed as limited to the embodiments set forth herein; A more thorough and complete understanding of the present disclosure. It should be understood that the drawings and embodiments of the present disclosure are for exemplary purposes only, and are not intended to limit the protection scope of the present disclosure.

[0027] In the description of the embodiments of the present disclosure, the term "comprising" and its similar expressions should be interpreted as an open inclusion, that is, "including but not limited to". The term "based on" should be understood as "based at least in part on". The term "one embodiment" or "the embodiment" should be read as "at least one ...

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Abstract

According to example embodiments of the present disclosure, a method, apparatus and computer-readable storage medium for light source mask optimization are provided. A method for light source mask optimization includes generating multiple sub-jobs for optimizing light source and mask layout. Each sub-job specifies one or more operations to perform on at least one light source map and mask layout, and at least one light source map is associated with the light source. The method also includes assigning the plurality of sub-jobs to the plurality of processing devices based on the configuration information of the plurality of processing devices and the type of the one or more operations. At least one processing device of the plurality of processing devices is configured with accelerated processing resources. The method further includes determining at least an optimized light source map of the light source based on results of processing the plurality of sub-jobs by the plurality of processing devices. In this way, a fast and efficient light source mask optimization scheme can advantageously be achieved.

Description

technical field [0001] Embodiments of the present disclosure generally relate to integrated circuits, and more particularly, to methods, apparatus, and computer-readable storage media for light source mask optimization. Background technique [0002] The circuit layout (also referred to as the layout for short) is a series of geometric figures transformed from the design and simulation of the optimized circuit, which contains the physical information data related to the device such as the size of the integrated circuit and the topology definition of each layer. IC manufacturers make masks from this data. The layout pattern on the mask determines the feature size of the device or connection physical layer on the chip. At the same time, the lithography resolution also determines the size of these features on the chip. [0003] Source Mask Optimization (SMO) is a resolution enhancement technique for ultra-small pattern lithography. In the SMO process, the photolithography pro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F9/50G06F30/398
CPCG06F9/5005G06F30/398
Inventor 不公告发明人
Owner 全芯智造技术有限公司