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Method and equipment for supplying fluorine-gas-containing gas

A technology for supplying equipment and gas, which is applied in the field of fluorine-containing gas supply and supply equipment, which can solve the problems of complex structure of the device and inability to supply cleaning gas, etc., and achieve the effect of suppressing thermal deformation

Active Publication Date: 2021-04-09
RESONAC CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] According to the gas supply methods disclosed in Patent Documents 1 and 2, although the thermal deformation of the sealing material can be prevented, a shock wave attenuation mechanism is required, which not only complicates the device structure of the cleaning gas supply equipment, but also may not supply enough gas to consumer equipment. flow of purge gas

Method used

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  • Method and equipment for supplying fluorine-gas-containing gas

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] use with figure 1 The same equipment as the supply facility 1 supplies the fluorine-containing gas to the consumption facility in the same manner as above. refer to figure 1 Detailed description.

[0061] A filling container 2 with a capacity of 5 L filled with a fluorine-containing gas (first fluorine-containing gas) at a pressure of 14 MPa was prepared. The first fluorine-containing gas is a gas obtained by diluting the fluorine gas with nitrogen gas so that the fluorine gas concentration becomes 20% by volume. In addition, a second fluorine-containing gas supply source 16 including a fluorine-containing gas having the same composition as the first fluorine-containing gas is prepared as the second fluorine-containing gas.

[0062] For the first gate valve 8 and the pressure regulator 7, chlorotrifluoroethylene resin (polychlorotrifluoroethylene) is used as the material of the valve seat of the component parts.

[0063] The filling pressure of the second fluorine-c...

Embodiment 2

[0071] The same operation as in Example 1 was carried out before the cleaning treatment step. Thereafter, the third gate valve 11 is set to a closed state, and the first gate valve 8, the second gate valve 10, and the container valve 3 are set to an open state, and the first fluorine-containing gas in the filling container 2 is introduced into the upstream of the piping 4 Side section and buffer tank9. At this time, the first fluorine-containing gas is introduced for 10 seconds until the measured value of the second pressure gauge 6 reaches 7 MPa, and then the first fluorine-containing gas is further introduced for 10 seconds until the measured value of the second pressure gauge 6 reaches 14 MPa. gas. Thus, the sealing step and the subsequent introduction of the first fluorine-containing gas from the filling container 2 to the upstream portion of the piping 4 are performed continuously.

[0072] Next, the second gate valve 10 is set to the closed state, and the pressure regu...

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Abstract

Provided is a method for supplying a fluorine-gas-containing gas without complicating the device configuration of equipment for supplying the fluorine-gas-containing gas, and without reducing the fluorine gas concentration of the fluorine-gas-containing gas. A sealing step is carried out in which a second fluorine-gas-containing gas having a fluorine gas concentration in a range of +-10% of the fluorine gas concentration of a first fluorine-gas-containing gas is introduced into a portion of a pipe (4) between a container valve (3) and a pressure regulator (7) such that a pressure less than the gas pressure in a charging container (2) is achieved. After the sealing step a buffer tank (9) is opened and the first fluorine-gas-containing gas is introduced into the portion of the pipe (4) between the container valve (3) and the pressure regulator (7) from the charging container (2), after which the pressure regulator (7) is opened and the first fluorine-gas-containing gas is supplied to consumption equipment (20) while the pressure is regulated by the pressure regulator (7).

Description

technical field [0001] The present invention relates to a supply method and supply equipment of gas containing fluorine gas. Background technique [0002] Fluorine-containing gas is used as a cleaning gas for semiconductor manufacturing equipment. In the purge gas supply facility, in order to prevent the purge gas from leaking from the connection between each device and the piping, the connection is sealed with a sealing material made of a resin material with good shape conformability. However, when high-pressure gas is supplied from a container filled with high-pressure gas to consumer equipment through piping, heat and shock waves caused by adiabatic compression when the high-pressure gas is introduced from the container into the piping may cause heat deformation and melting of the sealing material. damaged or burned. [0003] Therefore, in order to prevent thermal deformation, melting, or burning of sealing materials, a gas supply method has been proposed to supply high...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F17C7/00F16K7/16F17C13/00
CPCF17C2270/0518F17C2221/037F17C2205/0338F17C2223/0123F17C2223/036F17C2225/0123F17C2225/035F17C2260/044F17C2250/043F17C5/06F17C13/00F17C7/00F17C13/025F16K7/16H01L21/67017F17C2205/0323F17C2205/0352F17C2221/01F17C2227/044
Inventor 西尾勇弥
Owner RESONAC CORPORATION