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Double slide synchronous buffer mechanism and sealed door device
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A technology of buffer mechanism and sealing door, which is applied to exposure devices of photoengraving process, opto-mechanical equipment, micro-lithography exposure equipment, etc.
Active Publication Date: 2022-04-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0008] The purpose of the present invention is to provide a double sliding table synchronous buffer mechanism and a sealing door device to solve the problem that the double sliding table is not synchronized and the sliding table will be damaged when the double sliding table is used for reciprocating motion
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Embodiment 1
[0048] First, please refer to figure 1, the double slide synchronous buffer mechanism provided by the embodiment of the present invention includes:
[0049] Two sliding tables 1, the two sliding tables 1 are respectively arranged on opposite sides of an operation object (such as a hermetic door) 100, and are used to drive the operation object 100 to reciprocate; and,
[0050] An adaptive adjustment structure 2, the adaptive adjustment structure 2 is arranged on the slide table 1, and is fixedly connected with the slide table 1, and the adaptive adjustment structure 2 has deformation along the direction of the reciprocating motion The degree of freedom is used to reduce the speed difference between the two sliding tables 1 by changing the amount of deformation in the reciprocating direction until the two sliding tables are synchronized.
[0051] As mentioned above, in the existing double-sliding table mechanism, when the two sliding tables move out of synchronization, it is ea...
Embodiment 2
[0068] The difference from Example 1 is that, if Figure 6 As shown, in this embodiment, the first buffer member 25 and the second buffer member 26 are second hydraulic buffers, and the first buffer member 25 and the second buffer member 26 adapt to Velocity difference, not spring deflection or telescopic deflection.
[0069] In this embodiment, the first buffer member 25 is fixed on the first baffle plate 22, and the second buffer member 26 is fixed on the second baffle plate 23. When the three baffles 29 adjust the pretightening force, the second buffer member 26 can be fixed on the third baffle 29 accordingly. At this time, the second buffer 26 and the second baffle 23 The relative positional relationship with the third baffle plate 29 is consistent with that of Embodiment 1, and will not be repeated here.
[0070]For example, if Figure 6 As shown, the first buffer member 25 and the second buffer member 26 may respectively include a fixing portion, respectively passing ...
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Abstract
The invention provides a double-slider synchronous buffer mechanism and a sealed door device, comprising: two sliders and an adaptive adjustment structure; the two slides are respectively arranged on opposite sides of an operation object, and are used to drive the operation The object reciprocates; the self-adaptive adjustment structure is arranged on one of the sliding tables and is fixedly connected with the sliding table. During the process of driving the operating object to reciprocate, when the two slides are out of sync due to different speeds, the adaptive adjustment structure generates force to act on the other slide through deformation in the reciprocating direction. on the slide table to reduce the speed difference between the two slide tables until the two slide tables are synchronized, thus avoiding damage to the slide table due to non-synchronization.
Description
technical field [0001] The invention relates to the technical field of photolithography equipment, in particular to a double-slide synchronous buffer mechanism and a sealed door device. Background technique [0002] At present, when the manipulator of the production line enters the exposure machine and other equipment, it needs to open a window in the whole machine equipment. However, in order to make the internal environment of the whole machine stable, well sealed, and less disturbed by the outside world, it is required to design a double-slider synchronous buffer mechanism. When the manipulator enters the whole machine, the airtight door descends; when the manipulator exits the whole machine, the airtight door rises. [0003] When the size of the substrate is larger, the size of the manipulator’s access window will also be larger. Taking the 6th generation substrate as an example, the size of the manipulator’s access window is 2300mm (length)*750mm (height), and the desig...
Claims
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Application Information
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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70808G03F7/70691
Inventor 刘凯王刚
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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