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Method for using photoresist material and detection system

A material and photoresist technology, applied in optics, optomechanical equipment, conveyor objects, etc., can solve problems such as error-prone, photoresist material deterioration, poor machine process, etc., to reduce man-hours, save costs, and avoid the possibility of labor error effect

Active Publication Date: 2021-11-09
HKC CORP LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] At present, the process of moving photoresist materials from the freezer to the machine mainly depends on manual judgment and directing the transport equipment to move to the machine. For example, the staff takes the photoresist materials out of the freezer and then uses transport tools such as cart Transport the photoresist material to the thawing room, and transport the thawed photoresist material to the machine. It can be frozen and thawed for repeated use without deterioration. However, after repeated repetitions, the photoresist material may deteriorate and deteriorate after use. The photoresist material will make the process of the machine poor, and it needs to be controlled manually, and it is easy to make mistakes through manual control

Method used

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  • Method for using photoresist material and detection system
  • Method for using photoresist material and detection system
  • Method for using photoresist material and detection system

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Embodiment Construction

[0059] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.

[0060] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.

[0061] Al...

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Abstract

The application discloses a method for using a photoresist material and a detection system, including steps: a freezer receives the photoresist material, and the photoresist material enters a frozen state; when receiving an instruction to thaw the photoresist material, sends the photoresist material out of the freezer And sent to the thawing room, the photoresist material enters the thawing state; when receiving the machine instruction, the photoresist material is sent out of the thawing room and sent to the machine; when the machine receives the photoresist material, the photoresist material is processed Detection, if the detection is qualified, it will be sent to the machine, and the photoresist material will enter the machine state; when the preset situation is detected, the material information of the photoresist material will be detected, and the photoresist material will be sent back to the thawing room or processing room according to the material information ; Through the automatic system detection method, the situation that manual errors may be avoided, and the working hours are reduced and the cost is saved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for using a photoresist material and a detection system. Background technique [0002] The photolithography process is a common process in the semiconductor manufacturing process. Photoresist (PR), also known as photoresist or photoresist, refers to an etch-resistant film material that changes its solubility through various light or radiation. It is a key material in the photolithography process and is mainly used in integrated circuits and display panels. [0003] At present, the process of moving photoresist materials from the freezer to the machine mainly depends on manual judgment and directing the transport equipment to move to the machine. For example, the staff takes the photoresist materials out of the freezer and then uses transport tools such as cart Transport the photoresist material to the thawing room, and transport the thawed photoresist materia...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20B65G47/74
CPCG03F7/70975B65G47/74
Inventor 潘柏松袁海江
Owner HKC CORP LTD
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